January 19, 2022 UMD Home NanoCenter AIMLab
Back to Equipment List Temescal Ebeam Deposition
Description The Temescal Electron Beam Deposition System is a 4-pocket ebeam evaporator. A versatile process tool, it is configured to hold anything from small samples up to twelve 3" or eight 4" wafers at a time. Four source pockets allow multiple layer thin film depositions in a single pumpdown cycle.

This tool is primarily used for metals deposition, including chromium, gold, titanium and aluminum.
Location FabLab | DEP Tunnel
Manufacturer Temescal BJD-1800
Staff Contact ThomasThomas Loughran
Reservations No upcoming reservations at this time.
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Tue, Sep 22, 2015
12:00 pm - 3:00 pm
Hyun-Tae Kim
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1.0 um of thermal wet oxide on 10, 4" wafers.
Mon, Aug 11, 2014
3:00 pm - 4:30 pm
Hyung Bae
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TiO2 deposition (thickness: 142 nm)
Mon, Aug 04, 2014
3:00 pm - 4:30 pm
Tao Gong
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Al deposition
Fri, Aug 01, 2014
4:00 pm - 5:00 pm
Wenzhong Bao
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Fri, Aug 01, 2014
9:00 am - 11:00 am
Thomas Loughran
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Evaporation Recipes

evapguide.pdf (180.42 KB)

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