September 25, 2020 UMD Home NanoCenter AIMLab
Back to Equipment List EVG 620 Mask Aligner
Description The EVG is stumbling on occasion. Let FABLAB staff know if you are having problems with performance. John Abrahams can train on the Suss MA-4 if necessary. Note: bulb changed 8-8-2019! Intensity is now 15 mw/cm2

Do NOT turn off after use, use SO use the new track ball and left button

The EVG 620 is a two-sided contact alignment and exposure tool. It is configured for 3", 4" and 6" wafers only. Its minimum achievable feature size is approximately one micron.

The EVG 620 is fitted with a special fixture which facilitates precise registration of two wafers in the aligner prior to using the EVG 01 Wafer Bonder.

Location FabLab | Photo Tunnel
Manufacturer EVG 620
Staff Contact JohnJohn Abrahams
Reservations No upcoming reservations at this time.
Please login to make a reservation.
Tue, Sep 24, 2019
4:00 pm - 4:15 pm
Michael Yeh
View Reservation
Mon, Sep 16, 2019
11:30 am - 11:45 am
Mitchell Gross
View Reservation

Deleted by: Mitchell Gross

Mon, Sep 09, 2019
9:00 am - 9:30 am
Mitchell Gross
View Reservation
Wed, Sep 04, 2019
10:00 am - 11:00 am
John Abrahams
View Reservation
Training Allie Elyahb Kwizera
Tue, Sep 03, 2019
1:30 pm - 1:45 pm
Mitchell Gross
View Reservation
Records to show:
620Bondalign.pdf (1.01 MB)
620Lithography.pdf (995.56 KB)
index.php (38 B)
photo-05_sop_EVG620_mask_aligner.pdf (86.36 KB)

You must have reservation permissions to view the manuals. Please login to view manuals.


NanoCenter Group NanoCenter

Communicate Director: John Abrahams
Contact the Webmaster

Links Logos
Privacy Policy

Copyright The University of Maryland University of Maryland
2004-2020 Privacy Policy