November 28, 2021 UMD Home NanoCenter AIMLab
Back to Equipment List EVG 620 Mask Aligner
Description EVG- 620 is back in operation with a NEW power supply, new "Y" motion motor and PM. Note: bulb changed 11-11-2020 Intensity is now 24 mw/cm2

Do NOT turn off after use, use SO use the new track ball and left button

The EVG 620 is a two-sided contact alignment and exposure tool. It is configured for 3", 4" and 6" wafers only. Its minimum achievable feature size is approximately one micron.

The EVG 620 is fitted with a special fixture which facilitates precise registration of two wafers in the aligner prior to using the EVG 01 Wafer Bonder.

Power supply
Location FabLab | Photo Tunnel
Manufacturer EVG 620
Staff Contact JohnJohn Abrahams
Reservations No upcoming reservations at this time.
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Fri, Nov 05, 2021
9:30 am - 10:30 am
Sean O'Leary
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Training Sean on EVG
Thu, Nov 04, 2021
9:30 am - 10:30 am
Angela Chapman
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Training with SU-8
Tue, Oct 26, 2021
10:00 am - 11:00 am
Sean O'Leary
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Deleted by: John Abrahams

Backside align training
Thu, Oct 21, 2021
1:00 pm - 2:00 pm
Abhay Andar
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Fri, Oct 08, 2021
4:30 pm - 5:30 pm
Sean O'Leary
View Reservation
Records to show:
620Bondalign.pdf (1.01 MB)
620Lithography.pdf (995.56 KB)
index.php (38 B)
photo-05_sop_EVG620_mask_aligner.pdf (86.36 KB)

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