December 1, 2021 UMD Home NanoCenter AIMLab
Back to Equipment List MJB-3 Mask aligner- right of spin station #1
Description The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below.
Location FabLab | Teaching Lab
Manufacturer Karl Suss America Inc. MJB-3
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Reservations No upcoming reservations at this time.
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Logs
Fri, Nov 19, 2021
4:45 pm - 5:00 pm
JIHUN PARK
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Wed, Nov 17, 2021
7:15 am - 8:00 am
Benjamin Barnes
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Tue, Nov 09, 2021
9:00 am - 11:00 am
Mark Lecates
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Thu, Nov 04, 2021
1:30 pm - 1:45 pm
Benjamin Barnes
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Wed, Nov 03, 2021
9:00 am - 12:00 pm
Mark Lecates
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Records to show:
SOPs
Photo-03 - SOP - MJB-3 Mask Aligner.pdf (64.6 KB)
index.php (38 B)
Manuals

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Recipes

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