September 25, 2020 UMD Home NanoCenter AIMLab
Back to Equipment List MJB-3 Mask aligner- right of spin station #1
Description The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below.
Location FabLab | Teaching Lab
Manufacturer Karl Suss America Inc. MJB-3
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Reservations No upcoming reservations at this time.
Please login to make a reservation.
Logs
Fri, Sep 25, 2020
1:30 pm - 2:00 pm
Bo Miao
View Reservation
tom
Fri, Sep 25, 2020
8:30 am - 12:00 pm
Thomas Loughran
View Reservation
ENEE 416
Thu, Sep 24, 2020
9:00 am - 10:00 am
Bo Miao
View Reservation
tom
Wed, Sep 23, 2020
12:00 pm - 3:30 pm
Mark Lecates
View Reservation
Enee416 class
Wed, Sep 23, 2020
9:00 am - 12:00 pm
John Abrahams
View Reservation
Records to show:
SOPs
Photo-03 - SOP - MJB-3 Mask Aligner.pdf (64.6 KB)
index.php (38 B)
Manuals

You must have reservation permissions to view the manuals. Please login to view manuals.

Recipes

NanoCenter Group NanoCenter
FabLab
AIMLab

Communicate Director: John Abrahams
Contact the Webmaster

Links Logos
Privacy Policy
Sitemap

Copyright The University of Maryland University of Maryland
2004-2020 Privacy Policy
Sitemap