September 26, 2017 UMD Home NanoCenter AIMLab
Back to Equipment List MJB-3 Mask aligner- right of spin station
Description The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below.
Location FabLab | Teaching Lab
Manufacturer Karl Suss America Inc. MJB-3
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Discussion Link Lithography Discussion Page
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Date Start End User
09/29/2017 09:00 AM 12:00 PM John Abrahams

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Fri, Sep 29, 2017
9:00 am - 12:00 pm
John Abrahams
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Tue, Sep 26, 2017
9:00 am - 12:00 pm
Mark Lecates
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Mon, Sep 25, 2017
3:30 pm - 4:00 pm
Shengjie Xie
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Mon, Sep 25, 2017
12:30 pm - 3:30 pm
Mark Lecates
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Sun, Sep 24, 2017
1:45 pm - 2:30 pm
Tarapada Sarkar
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Records to show:
SOPs
Photo-03 - SOP - MJB-3 Mask Aligner.pdf (64.6 KB)
index.php (38 B)
Manuals

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Recipes

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