September 25, 2020 UMD Home NanoCenter AIMLab
Back to Equipment List MJB-3 Mask aligner- right of spin station #1
Description The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below.
Location FabLab | Teaching Lab
Manufacturer Karl Suss America Inc. MJB-3
Staff Contact JohnJohn Abrahams
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Fri, Sep 25, 2020
1:30 pm - 2:00 pm
Bo Miao
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Fri, Sep 25, 2020
8:30 am - 12:00 pm
Thomas Loughran
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ENEE 416
Thu, Sep 24, 2020
9:00 am - 10:00 am
Bo Miao
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Wed, Sep 23, 2020
12:00 pm - 3:30 pm
Mark Lecates
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Enee416 class
Wed, Sep 23, 2020
9:00 am - 12:00 pm
John Abrahams
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Records to show:
Photo-03 - SOP - MJB-3 Mask Aligner.pdf (64.6 KB)
index.php (38 B)

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