February 22, 2018 UMD Home NanoCenter AIMLab
Back to Equipment List MJB-3 Mask aligner- right of spin station
Description The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below.
Location FabLab | Teaching Lab
Manufacturer Karl Suss America Inc. MJB-3
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Discussion Link Lithography Discussion Page
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Date Start End User
02/23/2018 09:00 AM 12:00 PM Mark Lecates

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Fri, Feb 23, 2018
9:00 am - 12:00 pm
Mark Lecates
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465 class
Thu, Feb 22, 2018
1:30 pm - 2:00 pm
David Shahin
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Wed, Feb 21, 2018
7:15 pm - 7:30 pm
David Shahin
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Wed, Feb 21, 2018
12:30 pm - 12:45 pm
Aysanew Abate
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Wed, Feb 21, 2018
9:00 am - 12:00 pm
Mark Lecates
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465 class
Records to show:
SOPs
Photo-03 - SOP - MJB-3 Mask Aligner.pdf (64.6 KB)
index.php (38 B)
Manuals

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Recipes

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