June 21, 2018 UMD Home NanoCenter AIMLab
Back to Equipment List MJB-3 Mask aligner- right of spin station
Description The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below.
Location FabLab | Teaching Lab
Manufacturer Karl Suss America Inc. MJB-3
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Discussion Link Lithography Discussion Page
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Date Start End User
06/22/2018 02:45 PM 03:30 PM Yang Zhang

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Fri, Jun 22, 2018
2:45 pm - 3:30 pm
Yang Zhang
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Thu, Jun 21, 2018
12:30 pm - 12:45 pm
Mitchell Gross
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Wed, Jun 20, 2018
1:45 pm - 2:00 pm
Christos Tengeris
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Wed, Jun 20, 2018
1:30 pm - 1:45 pm
Christos Tengeris
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Deleted by: Christos Tengeris

Wed, Jun 20, 2018
10:45 am - 11:00 am
Aysanew Abate
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SOPs
Photo-03 - SOP - MJB-3 Mask Aligner.pdf (64.6 KB)
index.php (38 B)
Manuals

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Recipes

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