PHOTO-03: MJB-3 Mask aligner- right of spin station

June 21, 2018 UMD Home NanoCenter AIMLab

Back to Equipment List MJB-3 Mask aligner- right of spin station

Description

The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below.

Location

FabLab | Teaching Lab

Manufacturer

Karl Suss America Inc. MJB-3

Staff Contact

John Abrahams
jabrah@umd.edu
301-405-6664

Discussion Link

Lithography Discussion Page
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Reservations

Date	Start	End	User
06/22/2018	02:45 PM	03:30 PM	Yang Zhang

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Logs

	Fri, Jun 22, 2018 2:45 pm - 3:30 pm Yang Zhang View Reservation
	Thu, Jun 21, 2018 12:30 pm - 12:45 pm Mitchell Gross View Reservation
	Wed, Jun 20, 2018 1:45 pm - 2:00 pm Christos Tengeris View Reservation
	Wed, Jun 20, 2018 1:30 pm - 1:45 pm Christos Tengeris View Reservation	Deleted by: Christos Tengeris
	Wed, Jun 20, 2018 10:45 am - 11:00 am Aysanew Abate View Reservation

SOPs

Photo-03 - SOP - MJB-3 Mask Aligner.pdf (64.6 KB)

index.php (38 B)

Manuals

You must have reservation permissions to view the manuals. Please login to view manuals.

Photo-03 - Optical Energy Controller Manual.pdf (1.09 MB)

Photo-03 - Suss MJB-3 Manual.pdf (8.92 MB)

index.php (38 B)

Recipes

Photoresist Processes

AZ4620_process.doc (25.5 KB)
NPR9 process.doc (24.5 KB)
NR9-1500PY.pdf (88.62 KB)
SPR220_resist_process.doc (25.5 KB)
baseline_shipley_1813_resist_chlorobenzene_lift.doc (28 KB)
chlorobenzene_lift.doc (28.5 KB)
photo_resist_pouring_procedure.doc (24 KB)
shipley_1813_positive_photolithography_process.doc (27 KB)