November 21, 2017 UMD Home NanoCenter AIMLab
Back to Equipment List MJB-3 Mask aligner- right of spin station
Description The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below.
Location FabLab | Teaching Lab
Manufacturer Karl Suss America Inc. MJB-3
Staff Contact JohnJohn Abrahams
Discussion Link Lithography Discussion Page
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Tue, Nov 21, 2017
2:00 pm - 2:30 pm
Mitchell Gross
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Tue, Nov 21, 2017
1:00 pm - 1:15 pm
Aysanew Abate
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Tue, Nov 21, 2017
12:00 pm - 1:00 pm
John Abrahams
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Mon, Nov 20, 2017
12:15 pm - 12:30 pm
Aysanew Abate
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Fri, Nov 17, 2017
2:15 pm - 2:45 pm
Xiaohang Zhang
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Records to show:
Photo-03 - SOP - MJB-3 Mask Aligner.pdf (64.6 KB)
index.php (38 B)

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