November 28, 2021 UMD Home NanoCenter AIMLab
Back to Equipment List Oriel Area UV Exposure System
Description Note: new bulb installed 12/13/13. Intensity is substantially higher at ~14 mW/cm2 so check your times.

The Oriel Mask Aligner is a low-resolution mask alignment system. It can handle masks and substrates as large as 6” X 6”. The system is used primarily for copying masks or for single exposures where little or no alignment is required.

Location FabLab | Photo Tunnel
Manufacturer Oriel
Staff Contact FabLab Staff
fablab@umd.edu
Reservations No upcoming reservations at this time.
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Logs
Thu, Jan 23, 2020
1:30 pm - 1:45 pm
Deric Session
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Thursday
Wed, Jun 13, 2018
1:00 pm - 1:30 pm
Drew Stasak
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Sun, May 06, 2018
7:15 pm - 7:30 pm
Drew Stasak
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Mon, Apr 16, 2018
1:00 pm - 1:30 pm
John Abrahams
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Thu, Mar 29, 2018
1:30 pm - 1:45 pm
Julia Sell
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Records to show:
SOPs
index.php (38 B)
photo-07_sop_Oriel_mask_aligner.pdf (69.16 KB)
Manuals

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Recipes

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