February 4, 2023 UMD Home NanoCenter AIMLab
Back to Equipment List LP-CVD Furnace
Description The single-tube CVD furnace is used for growing gate oxide, poly silicon, spin on glass dopant drive-in and contact anneals. Different tubes are used for different processes.

This furnace is for the use of FabLab staff only.
Location FabLab | CVD Tunnel
Manufacturer CVD Systems
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
Reservations No upcoming reservations at this time.
Please login to make a reservation.
External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Logs
Tue, Jan 03, 2012
11:00 am - 12:00 pm
Chuanfu Sun
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Thu, Dec 15, 2011
9:30 am - 2:00 pm
Chuanfu Sun
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Deleted by: Chuanfu Sun

Wed, Dec 14, 2011
9:45 am - 2:00 pm
Chuanfu Sun
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Fri, Jun 24, 2011
12:30 pm - 2:00 pm
Ben Cooper
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Mon, Oct 11, 2010
1:00 pm - 2:30 pm
Hongwei Liao
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500A of poly @ 500C
Records to show:
SOPs
cvd-05_sop.pdf (270.21 KB)
index.php (38 B)
Manuals

You must have reservation permissions to view the manuals. Please login to view manuals.

Recipes

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