November 21, 2017 UMD Home NanoCenter AIMLab
Back to Equipment List LP-CVD Furnace
Description The single-tube CVD furnace is used for growing gate oxide, poly silicon, spin on glass dopant drive-in and contact anneals. Different tubes are used for different processes.

This furnace is for the use of FabLab staff only.
Location FabLab | CVD Tunnel
Manufacturer CVD Systems
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
Discussion Link Deposition Discussion Page
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Reservations No upcoming reservations at this time.
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Logs
Tue, Jan 03, 2012
11:00 am - 12:00 pm
Chuanfu Sun
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Thu, Dec 15, 2011
9:30 am - 2:00 pm
Chuanfu Sun
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Deleted by: Chuanfu Sun

Wed, Dec 14, 2011
9:45 am - 2:00 pm
Chuanfu Sun
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Fri, Jun 24, 2011
12:30 pm - 2:00 pm
Ben Cooper
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Mon, Oct 11, 2010
1:00 pm - 2:30 pm
Hongwei Liao
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500A of poly @ 500C
Records to show:
SOPs
cvd-05_sop.pdf (270.21 KB)
index.php (38 B)
Manuals

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Recipes

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