The single-tube CVD furnace is used for growing gate oxide, poly silicon, spin on glass dopant drive-in and contact anneals. Different tubes are used for different processes.
This furnace is for the use of FabLab staff only.
|Location||FabLab | CVD Tunnel|
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If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.
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