June 16, 2024 UMD Home NanoCenter AIMLab
Back to Equipment List MJB-3 Mask dual side aligner Fab Lab #3
Description The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below. A backside alignment option is available, allowing the registration of front side to backside masks, for creating three-dimensional structures.
Location FabLab | Photo Tunnel
Manufacturer Karl Suss America Inc. MJB-3 w/ Backside
Staff Contact ThomasThomas Loughran
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
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External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Thu, Aug 04, 2022
2:30 pm - 3:00 pm
Seungyeop Lee
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Fri, Oct 01, 2021
9:00 am - 12:00 pm
Thomas Loughran
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Tue, Sep 14, 2021
1:00 pm - 2:00 pm
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Wed, Mar 03, 2021
10:00 am - 11:00 am
Stefan Theodoru
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Mon, Sep 21, 2020
9:00 am - 10:30 am
Haotian Wang
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Records to show:
Photo-04 - SOP - MJB-3 Mask Aligner.pdf (1.18 MB)
index.php (38 B)

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