November 21, 2017 UMD Home NanoCenter AIMLab
Back to Equipment List MJB-3 Mask dual side aligner Fab Lab
Description The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below. A backside alignment option is available, allowing the registration of front side to backside masks, for creating three-dimensional structures.
Location FabLab | Photo Tunnel
Manufacturer Karl Suss America Inc. MJB-3 w/ Backside
Staff Contact ThomasThomas Loughran
Discussion Link Lithography Discussion Page
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Records to show:
Photo-04 - SOP - MJB-3 Mask Aligner.pdf (1.18 MB)
index.php (38 B)

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