June 21, 2018 UMD Home NanoCenter AIMLab
Back to Equipment List MJB-3 Mask dual side aligner Fab Lab
Description The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below. A backside alignment option is available, allowing the registration of front side to backside masks, for creating three-dimensional structures.
Location FabLab | Photo Tunnel
Manufacturer Karl Suss America Inc. MJB-3 w/ Backside
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
Discussion Link Lithography Discussion Page
Login Help
Reservations No upcoming reservations at this time.
Please login to make a reservation.
Logs
Mon, Mar 12, 2018
4:45 pm - 5:00 pm
David Shahin
View Reservation
Wed, Mar 07, 2018
1:00 pm - 1:30 pm
David Shahin
View Reservation
Wed, Mar 07, 2018
11:45 am - 12:00 pm
David Shahin
View Reservation
Tue, Mar 06, 2018
5:45 pm - 6:45 pm
David Shahin
View Reservation
Tue, Mar 06, 2018
9:15 am - 9:45 am
David Shahin
View Reservation
Records to show:
SOPs
Photo-04 - SOP - MJB-3 Mask Aligner.pdf (1.18 MB)
index.php (38 B)
Manuals

You must have reservation permissions to view the manuals. Please login to view manuals.

Recipes

NanoCenter Group NanoCenter
FabLab
AIMLab

Communicate Director: Jim O'Connor
Contact the Webmaster

Links Logos
Privacy Policy
Sitemap

Copyright The University of Maryland University of Maryland
2004-2018 Privacy Policy
Sitemap