February 4, 2023 UMD Home NanoCenter AIMLab
Back to Equipment List MJB-3 Mask dual side aligner Fab Lab #3
Description The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below. A backside alignment option is available, allowing the registration of front side to backside masks, for creating three-dimensional structures.
Location FabLab | Photo Tunnel
Manufacturer Karl Suss America Inc. MJB-3 w/ Backside
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
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External Materials

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Logs
Thu, Aug 04, 2022
2:30 pm - 3:00 pm
Seungyeop Lee
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Fri, Oct 01, 2021
9:00 am - 12:00 pm
Thomas Loughran
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Tue, Sep 14, 2021
1:00 pm - 2:00 pm
JIHUN PARK
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Wed, Mar 03, 2021
10:00 am - 11:00 am
Stefan Theodoru
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Mon, Sep 21, 2020
9:00 am - 10:30 am
Haotian Wang
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tom
Records to show:
SOPs
Photo-04 - SOP - MJB-3 Mask Aligner.pdf (1.18 MB)
index.php (38 B)
Manuals

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Recipes

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