December 1, 2021 UMD Home NanoCenter AIMLab
Back to Equipment List Developing Bench
Description NOTE: This Bench is for developing photoresist only. Use other wet benches for any other wet processing you need to do.

Working with wet chemicals can be hazardous if you don't follow the proper procedures at all times. Violating procedure risks not only your health but also the health and safety of other users and may result in loss of access to FabLab for an extended period of time.
Location FabLab | Photo Tunnel
Manufacturer
Staff Contact FabLab Staff
fablab@umd.edu
Reservations No upcoming reservations at this time.
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Logs
Wed, Dec 01, 2021
10:45 am - 11:00 am
Yuqi Zhao
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Tue, Nov 30, 2021
3:00 pm - 3:15 pm
Ian Smith
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Sat, Nov 20, 2021
9:45 pm - 10:00 pm
Jiahao Zhan
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Thu, Nov 18, 2021
3:30 pm - 3:45 pm
Niloy Acharjee
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Thu, Nov 18, 2021
9:15 am - 9:30 am
Mustafa Buyukkaya
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Records to show:
SOPs
index.php (38 B)
photo-10_sop_developing_bench.pdf (59.58 KB)
Manuals

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Recipes

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