PHOTORESISTS ONLY PLEASE
Other polymeric materials, spin on glasses, etc. should be coated using the Polymer Spin Station in the Exploratory Lab.
Use appropriately-sized vacuum hold down chucks for the size of your sample. All of the vacuum holes must be covered by the sample. Failure to do so may cause your sample to fly off and break and/or allow polymers to get inside of the chuck which results in a major cleaning effort by our staff.
Working with wet chemicals can be hazardous if you don’t follow the proper procedures at all times. Violating procedure risks not only your health but also the health and safety of other users and may result in loss of access to FabLab for an extended period of time.
|Location||FabLab | Teaching Lab|
|Discussion Link||Lithography Discussion Page
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Photoresist ProcessesAZ4620_process.doc (25.5 KB)
NPR9 process.doc (24.5 KB)
NR9-1500PY.pdf (88.62 KB)
SPR220_resist_process.doc (25.5 KB)
baseline_shipley_1813_resist_chlorobenzene_lift.doc (28 KB)
chlorobenzene_lift.doc (28.5 KB)
photo_resist_pouring_procedure.doc (24 KB)
shipley_1813_positive_photolithography_process.doc (27 KB)