The Raith e_line is a versatile e-beam system for nano structuring and patterning using a TFE filament for ultra high resolution capability. Patterns can be done in either stitching mode or "Fixed Beam Moving Stage" mode. FBMS eliminates stitching errors on larger structures such as wave guides.
This tool is to be used only as an Ebeam writer. For runs longer than 4-5 hours please start your run in the evening and let it run over night. If you need SEM images please see a FabLab Staff member for imaging on the Hitachi S3400N, the JEOL JSM-6400 or the NISP Lab Staff on the SU-70.
|Location||FabLab | Exploratory Lab|
|Discussion Link||Lithography Discussion Page
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Photoresist ProcessesAZ4620_process.doc (25.5 KB)
NPR9 process.doc (24.5 KB)
NR9-1500PY.pdf (88.62 KB)
SPR220_resist_process.doc (25.5 KB)
baseline_shipley_1813_resist_chlorobenzene_lift.doc (28 KB)
chlorobenzene_lift.doc (28.5 KB)
photo_resist_pouring_procedure.doc (24 KB)
shipley_1813_positive_photolithography_process.doc (27 KB)