September 26, 2017 UMD Home NanoCenter AIMLab
Back to Equipment List Raith e_LiNE
Description The Raith e_line is a versatile e-beam system for nano structuring and patterning using a TFE filament for ultra high resolution capability. Patterns can be done in either stitching mode or "Fixed Beam Moving Stage" mode. FBMS eliminates stitching errors on larger structures such as wave guides.

This tool is to be used only as an Ebeam writer. For runs longer than 4-5 hours please start your run in the evening and let it run over night. If you need SEM images please see a FabLab Staff member for imaging on the Hitachi S3400N, the JEOL JSM-6400 or the NISP Lab Staff on the SU-70.

Location FabLab | Exploratory Lab
Manufacturer Raith
Staff Contact JonathanJonathan Hummel
301 405-5017
Discussion Link Lithography Discussion Page
Login Help
Date Start End User
09/26/2017 05:00 PM 07:30 PM Shengjie Xie
09/26/2017 08:00 PM 12:00 AM Jiahao Zhan
09/27/2017 09:00 AM 02:00 PM Cody Ballard
09/27/2017 02:00 PM 05:00 PM Young Min Kim
09/27/2017 06:00 PM 12:00 AM Yiwen Hu

Please login to make a reservation.
Thu, Sep 28, 2017
4:30 pm - 8:30 pm
Jiahao Zhan
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Thu, Sep 28, 2017
12:00 pm - 4:30 pm
Jongbum Kim
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Thu, Sep 28, 2017
- 12:00 pm
Yiwen Hu
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Wed, Sep 27, 2017
6:00 pm -
Yiwen Hu
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Wed, Sep 27, 2017
2:00 pm - 5:00 pm
Young Min Kim
View Reservation
Records to show:
index.php (38 B)
photo-01_Info_RAITH150.pdf (309.16 KB)
photo-01_Info_e_LiNE.pdf (379.32 KB)
photo-01_application_note_FBMS.pdf (196.72 KB)
photo-01_e_LiNE_technical_description.pdf (716.67 KB)

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