February 22, 2018 UMD Home NanoCenter AIMLab
Back to Equipment List Raith e_LiNE
Description The Raith e_line is a versatile e-beam system for nano structuring and patterning using a TFE filament for ultra high resolution capability. Patterns can be done in either stitching mode or "Fixed Beam Moving Stage" mode. FBMS eliminates stitching errors on larger structures such as wave guides.

This tool is to be used only as an Ebeam writer. For runs longer than 4-5 hours please start your run in the evening and let it run over night. If you need SEM images please see a FabLab Staff member for imaging on the Hitachi S3400N, the JEOL JSM-6400 or the NISP Lab Staff on the SU-70.

Location FabLab | Exploratory Lab
Manufacturer Raith
Staff Contact JonathanJonathan Hummel
jhummel1@umd.edu
301 405-5017
Discussion Link Lithography Discussion Page
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Logs
Thu, Feb 22, 2018
10:00 am - 12:00 pm
Shahriar Aghaeimeibodi
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Wed, Feb 21, 2018
5:00 pm - 7:15 pm
Sudeep Dutta
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Tue, Feb 20, 2018
7:15 pm - 9:00 pm
Jiahao Zhan
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Tue, Feb 20, 2018
11:00 am - 2:30 pm
Shengjie Xie
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Mon, Feb 19, 2018
4:00 pm - 9:00 pm
Yiwen Hu
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Records to show:
SOPs
index.php (38 B)
photo-01_Info_RAITH150.pdf (309.16 KB)
photo-01_Info_e_LiNE.pdf (379.32 KB)
photo-01_application_note_FBMS.pdf (196.72 KB)
photo-01_e_LiNE_technical_description.pdf (716.67 KB)
Manuals

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Recipes

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