The Raith e_line is a versatile e-beam system for nano structuring, patterning and imaging using a Thermal Field Emission filament for ultra high resolution capability. Patterns can be done in either stitching mode or "Fixed Beam Moving Stage" mode. FBMS eliminates stitching errors on larger structures such as wave guides that can range over multiple millimeter distances. The electron column has a unique cross over free beam path that give high beam current and exceedingly low aberrations for top quality patterning and unsurpassed low voltage imaging even below 1keV.
For runs longer than 4-5 hours please start your run in the evening and let it run over night.
|Location||FabLab | Exploratory Lab SEM room|
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Photoresist ProcessesAZ4620_process.doc (25.5 KB)
NPR9 process.doc (24.5 KB)
NR9-1500PY.pdf (88.62 KB)
SPR220_resist_process.doc (25.5 KB)
baseline_shipley_1813_resist_chlorobenzene_lift.doc (28 KB)
chlorobenzene_lift.doc (28.5 KB)
photo_resist_pouring_procedure.doc (24 KB)
shipley_1813_positive_photolithography_process.doc (27 KB)