August 23, 2019 UMD Home NanoCenter AIMLab
Back to Equipment List Raith e_LiNE
Description The Raith e_line is a versatile e-beam system for nano structuring, patterning and imaging using a Thermal Field Emission filament for ultra high resolution capability. Patterns can be done in either stitching mode or "Fixed Beam Moving Stage" mode. FBMS eliminates stitching errors on larger structures such as wave guides that can range over multiple millimeter distances. The electron column has a unique cross over free beam path that give high beam current and exceedingly low aberrations for top quality patterning and unsurpassed low voltage imaging even below 1keV.

For runs longer than 4-5 hours please start your run in the evening and let it run over night.

Location FabLab | Exploratory Lab SEM room
Manufacturer Raith
Staff Contact JonathanJonathan Hummel
jhummel1@umd.edu
301 405-5017
Reservations
Date Start End User
08/26/2019 10:30 AM 01:30 PM Jinsong Xu
08/26/2019 01:30 PM 04:30 PM JAYAPRAKASH POOJALI

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Logs
Mon, Aug 26, 2019
1:30 pm - 4:30 pm
JAYAPRAKASH POOJALI
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Mon, Aug 26, 2019
10:30 am - 1:30 pm
Jinsong Xu
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Fri, Aug 23, 2019
1:00 pm - 3:00 pm
Tamin Tai
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Fri, Aug 23, 2019
9:30 am - 12:30 pm
JAYAPRAKASH POOJALI
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Deleted by: JAYAPRAKASH POOJALI

Thu, Aug 22, 2019
2:45 pm - 4:45 pm
Christos Tengeris
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Records to show:
SOPs
index.php (38 B)
photo-01_Info_RAITH150.pdf (309.16 KB)
photo-01_Info_e_LiNE.pdf (379.32 KB)
photo-01_application_note_FBMS.pdf (196.72 KB)
photo-01_e_LiNE_technical_description.pdf (716.67 KB)
Manuals

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Recipes

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