June 21, 2018 UMD Home NanoCenter AIMLab
Back to Equipment List Raith e_LiNE
Description The Raith e_line is a versatile e-beam system for nano structuring and patterning using a TFE filament for ultra high resolution capability. Patterns can be done in either stitching mode or "Fixed Beam Moving Stage" mode. FBMS eliminates stitching errors on larger structures such as wave guides.

This tool is to be used only as an Ebeam writer. For runs longer than 4-5 hours please start your run in the evening and let it run over night. If you need SEM images please see a FabLab Staff member for imaging on the Hitachi S3400N, the JEOL JSM-6400 or the NISP Lab Staff on the SU-70.

Location FabLab | Exploratory Lab
Manufacturer Raith
Staff Contact JonathanJonathan Hummel
301 405-5017
Discussion Link Lithography Discussion Page
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Date Start End User
06/22/2018 10:00 AM 12:00 PM Yang Zhang

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Tue, Jun 26, 2018
1:00 pm - 3:00 pm
Kevin Denis
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Deleted by: Jonathan Hummel

Fri, Jun 22, 2018
10:00 am - 12:00 pm
Yang Zhang
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Thu, Jun 21, 2018
1:00 pm - 5:30 pm
Yang Zhang
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Wed, Jun 20, 2018
10:00 am - 11:00 am
Shahriar Aghaeimeibodi
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Deleted by: Shahriar Aghaeimeibodi

Wed, Jun 20, 2018
8:00 am - 9:45 am
Ari Brown
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Records to show:
index.php (38 B)
photo-01_Info_RAITH150.pdf (309.16 KB)
photo-01_Info_e_LiNE.pdf (379.32 KB)
photo-01_application_note_FBMS.pdf (196.72 KB)
photo-01_e_LiNE_technical_description.pdf (716.67 KB)

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