January 18, 2020 UMD Home NanoCenter AIMLab
Back to Equipment List Raith off line computer
Description

The RAITH eLine Direct Write Ebeam System is FabLab’s primary choice for ultra high resolution patterning, while handling up to 4 inch wafers. For complex applications using masks and wafers, there are sophisticated options like height sensing and leveling, which keep the sample in focus even over these large travel ranges, and field stitching for large area patterns. The ultimate linewidth resolution of this tool is less than 20 nm.

The Raith Offline Computer is available for users to edit their write routines without tying up the Raith eLine system.

There is no charge for Raith e_Line users for using this computer in conjunction with the e_Line system. Others using the offline computer for designs for other tools will be charged for use of this computer.

Location FabLab | Exploratory Lab
Manufacturer Raith
Staff Contact JonathanJonathan Hummel
jhummel1@umd.edu
301 405-5017
Reservations No upcoming reservations at this time.
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Logs
Fri, Jan 17, 2020
3:00 pm - 5:00 pm
JAYAPRAKASH POOJALI
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Deleted by: JAYAPRAKASH POOJALI

Raith User
Fri, Jan 17, 2020
11:30 am - 12:00 pm
JAYAPRAKASH POOJALI
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Raith user
Thu, Jan 16, 2020
1:00 pm - 4:00 pm
Daniel Lewis
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Raith user
Wed, Jan 15, 2020
3:45 pm - 4:15 pm
Harjot Singh
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Wed, Jan 08, 2020
1:30 pm - 3:15 pm
JAYAPRAKASH POOJALI
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Raith user
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