The HEATPULSE 410 and 610 are rapid thermal processor systems which use high intensity visible radiation to heat single substrates for short periods (typically 1-6,000 seconds although up to 9,999 seconds is available) at precisely controlled temperatures.
Key features include:
Always check with FABLAB staff before use.
This system is for CLEAN Silicon only.
Clean means no metals and no organics.
|Location||FabLab | CVD Tunnel|
AG Associated 610
|Discussion Link||Deposition Discussion Page
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