September 26, 2017 UMD Home NanoCenter AIMLab
Description The HEATPULSE 410 and 610 are rapid thermal processor systems which use high intensity visible radiation to heat single substrates for short periods (typically 1-6,000 seconds although up to 9,999 seconds is available) at precisely controlled temperatures.
Key features include:
  • Closed loop temperature control with thermocouple temp sensing
  • Precise time-temperature profiles tailored to specific processes
  • Rapid heating and cooling rates
  • Consistent sample-to-sample process cycle repeatability
  • An extensive library of proven recipes
AG Associates model 410 Rapid Thermal Annealer used for annealing samples up to 6" using Thermocouple to 800 degrees Celsius or Pyrometer above 800.
Always check with FABLAB staff before use.
This system is for CLEAN Silicon only.
Clean means no metals and no organics.
Location FabLab | CVD Tunnel
Manufacturer AG Associated 610
Staff Contact JohnJohn Abrahams
Discussion Link Deposition Discussion Page
Login Help
Reservations No upcoming reservations at this time.
Please login to make a reservation.
Thu, Sep 21, 2017
1:00 pm - 1:15 pm
Lara Skibbie
View Reservation
Fri, Jul 21, 2017
11:00 am - 11:15 am
Mitchell Gross
View Reservation
Mon, Jun 26, 2017
1:15 pm - 1:30 pm
Mitchell Gross
View Reservation
Thu, Jun 08, 2017
1:00 pm - 1:30 pm
Alexander Yuan
View Reservation
Wed, May 31, 2017
12:15 pm - 12:30 pm
Mitchell Gross
View Reservation
Records to show:
cvd-02_SOP_Rapid_Thermal_Annealer_610.pdf (510.35 KB)
index.php (38 B)

You must have reservation permissions to view the manuals. Please login to view manuals.


NanoCenter Group NanoCenter

Communicate Director: Jim O'Connor
Contact the Webmaster

Links Logos
Privacy Policy

Copyright The University of Maryland University of Maryland
2004-2017 Privacy Policy