November 21, 2017 UMD Home NanoCenter AIMLab
Description The HEATPULSE 410 and 610 are rapid thermal processor systems which use high intensity visible radiation to heat single substrates for short periods (typically 1-6,000 seconds although up to 9,999 seconds is available) at precisely controlled temperatures.
Key features include:
  • Closed loop temperature control with thermocouple temp sensing
  • Precise time-temperature profiles tailored to specific processes
  • Rapid heating and cooling rates
  • Consistent sample-to-sample process cycle repeatability
  • An extensive library of proven recipes
AG Associates model 410 Rapid Thermal Annealer used for annealing samples up to 6" using Thermocouple to 800 degrees Celsius or Pyrometer above 800.
Always check with FABLAB staff before use.
This system is for CLEAN Silicon only.
Clean means no metals and no organics.
Location FabLab | CVD Tunnel
Manufacturer AG Associated 610
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Discussion Link Deposition Discussion Page
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SOPs
cvd-02_SOP_Rapid_Thermal_Annealer_610.pdf (510.35 KB)
index.php (38 B)
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