April 16, 2026 UMD Home NanoCenter AIM Lab
Back to Equipment List Oxford ICP Etcher(Chlorine)
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include:
  • Cl2, O2
  • SiCl4, SF6
  • CH4, Ar
  • H2, N2
This etcher is used primarily for etching III-V materials and aluminum.

The standard operating procedure for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
Staff Technical Assistance Time is added based on the time spent by staff members providing technical support, guidance & training outside of equipment training, and technical services for users of the lab. Click here for full rate details.
Reservations
Date Start End User
04/16/2026 01:30 PM 04:00 PM Sean O'Leary

Please login to make a reservation.
External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Logs
Thu, Apr 16, 2026
1:30 pm - 4:00 pm
Sean O'Leary
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Thu, Apr 16, 2026
11:15 am - 1:15 pm
Ryan Purcell
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Wed, Apr 15, 2026
12:30 pm - 12:45 pm
Joseph Senderling
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Tue, Apr 14, 2026
3:45 pm - 5:00 pm
Sean O'Leary
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Fri, Apr 10, 2026
10:45 am - 11:00 am
Maxwell Xuan
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Records to show:
SOPs
Oxford Chlorine Etcher SOP.pdf (384 KB)
index.php (38 B)
Manuals

You must have reservation permissions to view the manuals. Please login to view manuals.

Recipes

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