September 26, 2017 UMD Home NanoCenter AIMLab
Back to Equipment List Oxford PECVD
Description This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
  • SiO2 (both TEOS and SiH4-based)
  • SiNx
  • SiON
  • Α - Si
Location FabLab | CVD Tunnel
Manufacturer Oxford Instruments PlasmaLab System 100
Staff Contact ThomasThomas Loughran
Discussion Link Deposition Discussion Page
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Date Start End User
09/26/2017 04:00 PM 05:00 PM Yiwen Hu

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Tue, Sep 26, 2017
4:00 pm - 5:00 pm
Yiwen Hu
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Tue, Sep 26, 2017
11:00 am - 1:00 pm
Shengjie Xie
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Mon, Sep 25, 2017
2:15 pm - 3:00 pm
Lara Skibbie
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Deleted by: Lara Skibbie

Mon, Sep 25, 2017
12:45 pm - 1:15 pm
Lara Skibbie
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Mon, Sep 25, 2017
9:45 am - 12:45 pm
Kevin Palm
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Records to show:
Oxford PECVD SOP.pdf (709.05 KB)
index.php (38 B)

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