June 16, 2024 UMD Home NanoCenter AIMLab
Back to Equipment List Oxford PECVD
Description This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
  • SiO2 (both TEOS and SiH4-based)
  • SiNx
  • SiON
  • Α - Si
Location FabLab | CVD Tunnel
Manufacturer Oxford Instruments PlasmaLab System 100
Staff Contact ThomasThomas Loughran
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
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External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Wed, Jun 12, 2024
2:30 pm - 3:45 pm
Masoud Heidari Khouzani
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Wed, Jun 12, 2024
10:15 am - 11:00 am
Chengdao Yu
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Tue, Jun 11, 2024
11:00 am - 11:30 am
Fariba Islam
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Mon, Jun 10, 2024
1:30 pm - 2:30 pm
Masoud Heidari Khouzani
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Fri, Jun 07, 2024
4:15 pm - 6:15 pm
Maxwell Xuan
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Deleted by: Maxwell Xuan

Records to show:
Oxford PECVD SOP.pdf (709.05 KB)
index.php (38 B)

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