This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
|Location||FabLab | CVD Tunnel|
Oxford Instruments PlasmaLab System 100
|Discussion Link||Deposition Discussion Page
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