September 25, 2020 UMD Home NanoCenter AIMLab
Back to Equipment List Oxford PECVD
Description This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
  • SiO2 (both TEOS and SiH4-based)
  • SiNx
  • SiON
  • Α - Si
Location FabLab | CVD Tunnel
Manufacturer Oxford Instruments PlasmaLab System 100
Link
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
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Logs
Thu, Jul 23, 2020
9:30 am - 10:30 am
Aysanew Abate
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Deleted by: Mark Lecates

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Fri, Jul 10, 2020
9:30 am - 10:30 am
Aysanew Abate
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Deleted by: John Abrahams

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Thu, Jul 09, 2020
10:00 am - 2:00 pm
Yiwen Hu
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Tue, Jul 07, 2020
9:45 am - 10:15 am
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Abrahams-
Wed, Jul 01, 2020
9:45 am - 10:15 am
Aysanew Abate
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Records to show:
SOPs
Oxford PECVD SOP.pdf (709.05 KB)
index.php (38 B)
Manuals

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Recipes

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Communicate Director: John Abrahams
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