February 4, 2023 UMD Home NanoCenter AIMLab
Back to Equipment List Oxford PECVD
Description This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
  • SiO2 (both TEOS and SiH4-based)
  • SiNx
  • SiON
  • Α - Si
Location FabLab | CVD Tunnel
Manufacturer Oxford Instruments PlasmaLab System 100
Link
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
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External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Logs
Thu, Feb 02, 2023
3:00 pm - 4:00 pm
Mustafa Buyukkaya
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Wed, Feb 01, 2023
8:30 pm - 9:15 pm
Yang Zhang
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Wed, Feb 01, 2023
12:45 pm - 1:30 pm
Ryan Purcell
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Wed, Feb 01, 2023
10:00 am - 11:00 am
Mitchell Gross
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Mon, Jan 30, 2023
11:15 pm -
Mustafa Buyukkaya
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Records to show:
SOPs
Oxford PECVD SOP.pdf (709.05 KB)
index.php (38 B)
Manuals

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Recipes

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