November 28, 2021 UMD Home NanoCenter AIMLab
Back to Equipment List Oxford PECVD
Description This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
  • SiO2 (both TEOS and SiH4-based)
  • SiNx
  • SiON
  • Α - Si
Location FabLab | CVD Tunnel
Manufacturer Oxford Instruments PlasmaLab System 100
Staff Contact ThomasThomas Loughran
Reservations No upcoming reservations at this time.
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Tue, Nov 23, 2021
7:00 am - 11:45 am
Thomas Loughran
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off line
Mon, Nov 22, 2021
3:15 pm - 4:00 pm
Yuxi Jiang
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SiN deposition
Mon, Nov 22, 2021
10:15 am - 11:15 am
Jiahao Zhan
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Sat, Nov 20, 2021
11:45 pm -
Yang Zhang
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Sat, Nov 20, 2021
3:00 am - 4:30 am
Yang Zhang
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Records to show:
Oxford PECVD SOP.pdf (709.05 KB)
index.php (38 B)

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