June 21, 2018 UMD Home NanoCenter AIMLab
Back to Equipment List Atomic Layer Deposition System
Description TMA is currently depleted- approximate 3 weeks wait. The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Vanadium Oxide, Titanium Nitride and Zinc Oxide deposition. Warning: This system uses flammable materials such as Tri-Methyl Aluminum. Operation is limited to users approved and trained by FabLab staff.
Location FabLab | CVD Tunnel
Manufacturer Beneq TFS 500 ALD
Link
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Discussion Link Deposition Discussion Page
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Reservations
Date Start End User
06/22/2018 09:30 AM 10:00 AM John Abrahams

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Logs
Fri, Jun 22, 2018
9:30 am - 10:00 am
John Abrahams
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Training Huayu- 10 nm Al2O3
Thu, Jun 21, 2018
10:15 am - 11:30 am
Mustafa Buyukkaya
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Wed, Jun 20, 2018
2:30 pm - 3:30 pm
Abraham Chen
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Wed, Jun 20, 2018
1:30 pm - 2:30 pm
Abraham Chen
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Wed, Jun 20, 2018
1:00 pm - 2:00 pm
Abraham Chen
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Deleted by: Abraham Chen

Records to show:
SOPs
cvd-03_TFS_500_ALD_System_overview.pdf (1.02 MB)
cvd-03_tfs_500_tech_sheet.pdf (183.77 KB)
index.php (38 B)
Manuals

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Recipes

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