September 26, 2017 UMD Home NanoCenter AIMLab
Back to Equipment List Atomic Layer Deposition System
Description Check with John Abrahams for special instructions for use for the time being. The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Titanium Nitride and Zinc Oxide deposition. Warning: This system uses flammable materials such as Tri-Methyl Aluminum. Operation is limited to users approved and trained by FabLab staff. We have all precursors back in operation as of 3-7-2017
Location FabLab | CVD Tunnel
Manufacturer Beneq TFS 500 ALD
Staff Contact JohnJohn Abrahams
Discussion Link Deposition Discussion Page
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Date Start End User
09/26/2017 02:30 PM 02:45 PM Boyang Liu
09/27/2017 10:00 AM 11:00 AM John Abrahams
09/29/2017 10:00 AM 11:00 AM John Abrahams

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Fri, Sep 29, 2017
10:00 am - 11:00 am
John Abrahams
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Training Zhezhen Fu
Wed, Sep 27, 2017
10:00 am - 11:00 am
John Abrahams
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Training Zhezhen
Tue, Sep 26, 2017
2:30 pm - 2:45 pm
Boyang Liu
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Tue, Sep 26, 2017
10:30 am - 11:30 am
John Abrahams
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Deleted by: John Abrahams

Mon, Sep 25, 2017
3:30 pm - 4:15 pm
Nam Kim
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TiN trial
Records to show:
cvd-03_TFS_500_ALD_System_overview.pdf (1.02 MB)
cvd-03_tfs_500_tech_sheet.pdf (183.77 KB)
index.php (38 B)

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