September 26, 2017 UMD Home NanoCenter AIMLab
Back to Equipment List Atomic Layer Deposition System
Description Check with John Abrahams for special instructions for use for the time being. The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Titanium Nitride and Zinc Oxide deposition. Warning: This system uses flammable materials such as Tri-Methyl Aluminum. Operation is limited to users approved and trained by FabLab staff. We have all precursors back in operation as of 3-7-2017
Location FabLab | CVD Tunnel
Manufacturer Beneq TFS 500 ALD
Link
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Discussion Link Deposition Discussion Page
Login Help
Reservations
Date Start End User
09/26/2017 02:30 PM 02:45 PM Boyang Liu
09/27/2017 10:00 AM 11:00 AM John Abrahams
09/29/2017 10:00 AM 11:00 AM John Abrahams

Please login to make a reservation.
Logs
Fri, Sep 29, 2017
10:00 am - 11:00 am
John Abrahams
View Reservation
Training Zhezhen Fu
Wed, Sep 27, 2017
10:00 am - 11:00 am
John Abrahams
View Reservation
Training Zhezhen
Tue, Sep 26, 2017
2:30 pm - 2:45 pm
Boyang Liu
View Reservation
Tue, Sep 26, 2017
10:30 am - 11:30 am
John Abrahams
View Reservation

Deleted by: John Abrahams

Mon, Sep 25, 2017
3:30 pm - 4:15 pm
Nam Kim
View Reservation
TiN trial
Records to show:
SOPs
cvd-03_TFS_500_ALD_System_overview.pdf (1.02 MB)
cvd-03_tfs_500_tech_sheet.pdf (183.77 KB)
index.php (38 B)
Manuals

You must have reservation permissions to view the manuals. Please login to view manuals.

Recipes

NanoCenter Group NanoCenter
FabLab
AIMLab

Communicate Director: Jim O'Connor
Contact the Webmaster

Links Logos
Privacy Policy
Sitemap

Copyright The University of Maryland University of Maryland
2004-2017 Privacy Policy
Sitemap