September 25, 2020 UMD Home NanoCenter AIMLab
Back to Equipment List Atomic Layer Deposition System

No low temperature depositions and/or long exposure to precursors without explicit permission Do NOT open door to cool off system quickly. You need to tell FABLAB Staff to turn the temperature down 24 hours BEFORE you want to run.

The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Vanadium Oxide, Titanium Nitride and Zinc Oxide deposition.

*** ATTENTION- please put the type of precursor you are using in the notes when making reservations- i.e., Al2O3, V2O5 etc. ****

Aluminum, Zinc and Titanium Oxide runs will be charged at rates of the first four hours standard rates ($71/hour for UMD use, $108 Non- profit/University, $150- Small commercial, $200- Large commercial) followed by $35/hour after that.

Vanadium Oxides at standard rates ($71/hour for UMD- see above for other organizations) for TWO hours then $10/hour for the remaining.

Warning: This system uses flammable materials such as Tri-Methyl Aluminum and DiEthyl Zinc which are highly pyrophoric.

Operation is limited to users approved and trained by FabLab staff.

Location FabLab | CVD Tunnel
Manufacturer Beneq TFS 500 ALD
Staff Contact JohnJohn Abrahams
Reservations No upcoming reservations at this time.
Please login to make a reservation.
Fri, Sep 18, 2020
9:15 am - 10:00 am
Carl Brando
View Reservation
Tue, Sep 15, 2020
9:30 am - 11:30 am
Yevgeniy Ostrovskiy
View Reservation
Tue, Sep 08, 2020
8:45 am - 9:15 am
Carl Brando
View Reservation
Fri, Sep 04, 2020
11:00 am - 1:00 pm
George Caceres
View Reservation
Fri, Aug 28, 2020
11:00 am - 12:00 pm
Yevgeniy Ostrovskiy
View Reservation
Records to show:
cvd-03_TFS_500_ALD_System_overview.pdf (1.02 MB)
cvd-03_tfs_500_tech_sheet.pdf (183.77 KB)
index.php (38 B)

You must have reservation permissions to view the manuals. Please login to view manuals.


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