November 21, 2017 UMD Home NanoCenter AIMLab
Back to Equipment List Atomic Layer Deposition System
Description Check with John Abrahams for special instructions for use for the time being. The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Titanium Nitride and Zinc Oxide deposition. Warning: This system uses flammable materials such as Tri-Methyl Aluminum. Operation is limited to users approved and trained by FabLab staff. We have all precursors back in operation as of 3-7-2017
Location FabLab | CVD Tunnel
Manufacturer Beneq TFS 500 ALD
Staff Contact JohnJohn Abrahams
Discussion Link Deposition Discussion Page
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Reservations No upcoming reservations at this time.
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Tue, Nov 21, 2017
3:30 pm - 4:00 pm
Shahriar Aghaeimeibodi
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Tue, Nov 21, 2017
7:00 am - 8:00 am
John Abrahams
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20 nm Al2O3 at 100 degrees C
Mon, Nov 20, 2017
5:00 pm - 5:30 pm
Yonggang Yao
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Mon, Nov 20, 2017
4:30 pm - 5:00 pm
Shahriar Aghaeimeibodi
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Deleted by: Shahriar Aghaeimeibodi

Sun, Nov 19, 2017
10:45 am - 11:00 am
Yunfeng Li
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Records to show:
cvd-03_TFS_500_ALD_System_overview.pdf (1.02 MB)
cvd-03_tfs_500_tech_sheet.pdf (183.77 KB)
index.php (38 B)

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