February 22, 2018 UMD Home NanoCenter AIMLab
Back to Equipment List Atomic Layer Deposition System
Description The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Titanium Nitride and Zinc Oxide deposition. Warning: This system uses flammable materials such as Tri-Methyl Aluminum. Operation is limited to users approved and trained by FabLab staff. We have all precursors back in operation as of 3-7-2017
Location FabLab | CVD Tunnel
Manufacturer Beneq TFS 500 ALD
Link
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Discussion Link Deposition Discussion Page
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Reservations
Date Start End User
02/23/2018 10:15 AM 01:00 PM David Somers

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Fri, Feb 23, 2018
10:15 am - 1:00 pm
David Somers
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Thu, Feb 22, 2018
2:00 pm - 4:30 pm
David Somers
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Deleted by: David Somers

Thu, Feb 22, 2018
2:00 pm - 2:45 pm
David Somers
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Wed, Feb 21, 2018
3:00 pm - 5:00 pm
Jongbum Kim
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Deleted by: Jongbum Kim

Wed, Feb 21, 2018
10:00 am - 10:15 am
Mitchell Gross
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Records to show:
SOPs
cvd-03_TFS_500_ALD_System_overview.pdf (1.02 MB)
cvd-03_tfs_500_tech_sheet.pdf (183.77 KB)
index.php (38 B)
Manuals

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Recipes

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