No low temperature depositions and/or long exposure to precursors without explicit permission Do NOT open door to cool off system quickly. You need to tell FABLAB Staff to turn the temperature down 24 hours BEFORE you want to run.
The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Vanadium Oxide, Titanium Nitride and Zinc Oxide deposition.
*** ATTENTION- please put the type of precursor you are using in the notes when making reservations- i.e., Al2O3, V2O5 etc. ****
Aluminum, Zinc and Titanium Oxide runs will be charged at rates of the first four hours standard rates ($71/hour for UMD use, $108 Non- profit/University, $150- Small commercial, $200- Large commercial) followed by $35/hour after that.Vanadium Oxides at standard rates ($71/hour for UMD- see above for other organizations) for TWO hours then $10/hour for the remaining.
Warning: This system uses flammable materials such as Tri-Methyl Aluminum and DiEthyl Zinc which are highly pyrophoric.
Operation is limited to users approved and trained by FabLab staff.
|Location||FabLab | CVD Tunnel|
Beneq TFS 500 ALD
|Reservations||No upcoming reservations at this time.
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00 TFS 500 User Manual Front Page.pdf (16.12 KB)
01 TFS 500 Technical description and specification v.1.1.pdf (373.37 KB)
02 TFS 500 Operation instruction v.1.2.pdf (372.92 KB)
04 TFS 500 Maintenance Instruction v.1.1.pdf (129.98 KB)
05 TFS 500 HMI Operating Instruction v.1.2.pdf (354.13 KB)
06 TFS 500 Software Maintenance Instruction v.1.2.pdf (21.95 KB)
07 TFS 500 Virtual Program Language v.1.2.pdf (80.62 KB)
08 TFS 500 Machine States v.1.1.pdf (4.43 KB)
09 TFS 500 Alarms v.1.1.pdf (20.02 KB)
11 TFS 500 PI-Diagram N5001120.pdf (92.27 KB)
TFS 500 Atomic Layer Deposition System.pdf (1.02 MB)
TFS 500 Feature Sheet.pdf (183.77 KB)