September 26, 2017 UMD Home NanoCenter AIMLab
Description The Tystar furnace has three dedicated tubes for the growth/deposition of:
  • gate-quality silicon dioxide
  • LPCVD polysilicon
  • LPCVD silicon nitride
The furnace tubes can accommodate batches of up to 25 three or four inch silicon wafers per run. Virgin silicon wafers only please!

This furnace is for FabLab staff use only.
Location FabLab | CVD Tunnel
Manufacturer Tystar Tytan
Link
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
Discussion Link Deposition Discussion Page
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Logs
Fri, Sep 08, 2017
7:00 pm - 8:00 pm
Jiahao Zhan
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1000A of LS Nitride 6:1
Fri, Aug 18, 2017
1:00 pm - 2:30 pm
Subhojit Dutta
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2000A of Si3N4 on 1, 3" silicon wafer
Tue, Aug 15, 2017
1:00 pm - 4:00 pm
Cameron Harner
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1.1um of thermal wet oxide on 10, 4" wafers
Wed, Aug 02, 2017
10:30 am - 10:30 am
Subhojit Dutta
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2.9KA of thermal wet oxide on 4, 3" Si wafers
Thu, Jul 27, 2017
1:00 pm - 2:00 pm
Shengjie Xie
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1000A of LPCVD Nitride
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