The Tystar furnace has three dedicated tubes for the growth/deposition of:gate-quality silicon dioxide,LPCVD polysilicon,LPCVD silicon nitride
The furnace tubes can accommodate batches of up to 25 three or four inch silicon wafers per run. Virgin silicon wafers only please! Furnace is for FabLab staff use only.
30 minute minimum charge
|Location||FabLab | CVD Tunnel|
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Cvd-06 - Flow Diag - LPCVD Low Stress Silicon Nitride - 110636A.pdf (82.46 KB)
Cvd-06 - Flow Diag - LPCVD Polysilicon - 110639A.pdf (72.16 KB)
Cvd-06 - Flow Diag - Wet Ox with TLC-Anneal - 107668A.pdf (57.43 KB)
Cvd-06 - Installation Layout Tyan Furnace, L-H System - 110632A.pdf (594.62 KB)
Cvd-06 - System Summary.doc (108 KB)
Cvd-06 - Vacuum Manifold Layout with Remote Pump - 110626A.pdf (377.5 KB)