June 21, 2018 UMD Home NanoCenter AIMLab
Description The Tystar furnace has three dedicated tubes for the growth/deposition of:
  • gate-quality silicon dioxide
  • LPCVD polysilicon
  • LPCVD silicon nitride
The furnace tubes can accommodate batches of up to 25 three or four inch silicon wafers per run. Virgin silicon wafers only please!

This furnace is for FabLab staff use only.
Location FabLab | CVD Tunnel
Manufacturer Tystar Tytan
Link
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
Discussion Link Deposition Discussion Page
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Logs
Tue, Jun 19, 2018
10:00 am - 11:00 am
Angelique Jarry
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Nitride deposition on 10, 3" Si wafers
Thu, Jun 14, 2018
9:30 am - 11:00 am
Pengke Li
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1000A of dry oxide on 5, 2" Silicon wafers
Wed, Jun 06, 2018
11:00 am - 12:30 pm
Yang Zhang
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3000A of STNIT on 2 wafers
Wed, May 09, 2018
10:00 am - 11:30 am
Christos Tengeris
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1000A of thermal dry oxide on 10, 3" Silicon wafers.
Wed, Mar 07, 2018
8:00 am - 11:00 am
Stoyan Jeliazkov
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Thermal wet oxide growth at 950C for 3-hours
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