September 26, 2017 UMD Home NanoCenter AIMLab
Description The Tystar furnace has three dedicated tubes for the growth/deposition of:
  • gate-quality silicon dioxide
  • LPCVD polysilicon
  • LPCVD silicon nitride
The furnace tubes can accommodate batches of up to 25 three or four inch silicon wafers per run. Virgin silicon wafers only please!

This furnace is for FabLab staff use only.
Location FabLab | CVD Tunnel
Manufacturer Tystar Tytan
Staff Contact ThomasThomas Loughran
Discussion Link Deposition Discussion Page
Login Help
Reservations No upcoming reservations at this time.
Please login to make a reservation.
Fri, Sep 08, 2017
7:00 pm - 8:00 pm
Jiahao Zhan
View Reservation
1000A of LS Nitride 6:1
Fri, Aug 18, 2017
1:00 pm - 2:30 pm
Subhojit Dutta
View Reservation
2000A of Si3N4 on 1, 3" silicon wafer
Tue, Aug 15, 2017
1:00 pm - 4:00 pm
Cameron Harner
View Reservation
1.1um of thermal wet oxide on 10, 4" wafers
Wed, Aug 02, 2017
10:30 am - 10:30 am
Subhojit Dutta
View Reservation
2.9KA of thermal wet oxide on 4, 3" Si wafers
Thu, Jul 27, 2017
1:00 pm - 2:00 pm
Shengjie Xie
View Reservation
1000A of LPCVD Nitride
Records to show:

You must have reservation permissions to view the manuals. Please login to view manuals.


NanoCenter Group NanoCenter

Communicate Director: Jim O'Connor
Contact the Webmaster

Links Logos
Privacy Policy

Copyright The University of Maryland University of Maryland
2004-2017 Privacy Policy