February 22, 2018 UMD Home NanoCenter AIMLab
Back to Equipment List Annealing Furnace, Multipurpose
Description

The general purpose annealing furnace can be used for "dirty" processing over a temperature range of 400-1025C Standard gases plumbed to the furnace include: oxygen, forming gas, nitrogen and argon. To ensure the best use of this tool and to minimize cross contamination please consult with a staff member before using the furnace. **Run time is charged at the general equipment rate for the first hour of the run plus $10 /hr for time exceeding one hour.

A small muffle furnace plumbed with the same gases is co-located is with the 4” furnace. It is used for ZnO work. The rate for this furnace is the same.

Location FabLab | Teaching Lab
Manufacturer
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
Discussion Link Annealing Discussion Page
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Logs
Wed, Feb 21, 2018
12:00 pm - 5:00 pm
Angelique Jarry
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Annealing at 500C under O2
Tue, Feb 13, 2018
7:00 am - 8:00 am
Jessie Zhang
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wafer clean W/O BOE on 3, 4" Si wafers and a 30 min N2 950C activation anneal.
Mon, Feb 12, 2018
2:00 am - 6:00 am
Jongbum Kim
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Sun, Feb 11, 2018
11:30 am - 1:00 pm
Kevin Palm
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Deleted by: Kevin Palm

Thu, Feb 08, 2018
8:00 am - 12:00 pm
John Abrahams
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