November 28, 2021 UMD Home NanoCenter AIMLab
Back to Equipment List MJB-3 Mask Aligner- Left of spin station #2
Description The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists.
Location FabLab | Teaching Lab
Manufacturer
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fablab@umd.edu
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Logs
Thu, Nov 18, 2021
9:30 am - 10:00 am
Emma Huckestein
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Expose 3 in mask of various MW antennas onto a 3 in sapphire wafer coated in 10 nm Cr and 300 nm Au.
Wed, Nov 17, 2021
10:00 am - 10:30 am
Emma Huckestein
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Deleted by: Emma Huckestein

Aligning mask onto 3 in sapphire wafer coated with 10 nm Cr and 300 nm gold.
Tue, Nov 09, 2021
9:00 am - 11:00 am
Mark Lecates
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Thu, Nov 04, 2021
12:15 pm - 12:45 pm
Marco Casareto
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Wed, Nov 03, 2021
9:00 am - 12:00 pm
Mark Lecates
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