PHOTO-11: March Jupiter III O2 plasma system

September 26, 2017 UMD Home NanoCenter AIMLab

Back to Equipment List March Jupiter III O2 plasma system

Description

The March Photoresist Stripper is used to remove photoresist residue. Plumbed with both CF4 and O2, the March is an aggressive etcher for any organic material.

Location

FabLab | Photo Tunnel

Manufacturer

March Jupiter III

Staff Contact

Thomas Loughran
tcl@umd.edu
301-405-3642

Discussion Link

Lithography Discussion Page
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Logs

	Thu, Aug 20, 2015 10:45 am - 11:00 am Edward Leong View Reservation	Deleted by: Edward Leong
	Tue, Aug 18, 2015 5:30 pm - 5:45 pm Faheng Zang View Reservation
	Tue, Aug 18, 2015 1:30 pm - 1:45 pm Brendan Cusack View Reservation
	Mon, Aug 10, 2015 2:30 pm - 2:45 pm Faheng Zang View Reservation
	Wed, Aug 05, 2015 2:00 pm - 2:15 pm deepa sritharan View Reservation

SOPs

index.php (38 B)

photo-11_sop_march_photoresist_plasma_system.pdf (2.78 MB)

Manuals

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Recipes