November 21, 2017 UMD Home NanoCenter AIMLab
Back to Equipment List March Jupiter III O2 plasma system
Description The March Photoresist Stripper is used to remove photoresist residue. Plumbed with both CF4 and O2, the March is an aggressive etcher for any organic material.
Location FabLab | Photo Tunnel
Manufacturer March Jupiter III
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
Discussion Link Lithography Discussion Page
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Thu, Aug 20, 2015
10:45 am - 11:00 am
Edward Leong
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Deleted by: Edward Leong

Tue, Aug 18, 2015
5:30 pm - 5:45 pm
Faheng Zang
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Tue, Aug 18, 2015
1:30 pm - 1:45 pm
Brendan Cusack
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Mon, Aug 10, 2015
2:30 pm - 2:45 pm
Faheng Zang
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Wed, Aug 05, 2015
2:00 pm - 2:15 pm
deepa sritharan
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SOPs
index.php (38 B)
photo-11_sop_march_photoresist_plasma_system.pdf (2.78 MB)
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