November 21, 2017 UMD Home NanoCenter AIMLab
Back to Equipment List March Jupiter III O2 plasma system
Description The March Photoresist Stripper is used to remove photoresist residue. Plumbed with both CF4 and O2, the March is an aggressive etcher for any organic material.
Location FabLab | Photo Tunnel
Manufacturer March Jupiter III
Staff Contact ThomasThomas Loughran
Discussion Link Lithography Discussion Page
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