March 28, 2024 UMD Home NanoCenter AIMLab
Back to Equipment List Branson Barrel Resist Stripper
Description

The Branson Barrel Photoresist Stripper is used to remove photoresist residue by means of an oxygen plasma. The Branson minimizes substrate damage.

To save wear and tear, excessive chamber cleaning and tool availability of our ICP etchers, please use the Branson rather than the Oxford tools for all photoresist descum etches.

Location FabLab | Photo Tunnel
Manufacturer Branson
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
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External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Logs
Wed, Oct 14, 2020
8:45 am - 9:00 am
Ashley Chapin
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Deleted by:

Mon, Oct 12, 2020
8:00 am - 8:30 am
Ashley Chapin
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Deleted by:

Thu, Oct 08, 2020
9:00 am - 9:30 am
Ashley Chapin
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Deleted by: Mark Lecates

Thu, Sep 17, 2020
1:30 pm - 2:00 pm
Carl Brando
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Deleted by:

Abrahams-
Thu, Sep 17, 2020
11:45 am - 12:00 pm
Jacqueline Hines
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Deleted by:

Abrahams-
Records to show:
SOPs
Photo-14 - SOP - Branson Photoresist Stripper.pdf (593.24 KB)
index.php (38 B)
Manuals

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Recipes

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