September 25, 2020 UMD Home NanoCenter AIMLab
Back to Equipment List Branson Barrel Resist Stripper
Description

The Branson Barrel Photoresist Stripper is used to remove photoresist residue by means of an oxygen plasma. The Branson minimizes substrate damage.

To save wear and tear, excessive chamber cleaning and tool availability of our ICP etchers, please use the Branson rather than the Oxford tools for all photoresist descum etches.

Location FabLab | Photo Tunnel
Manufacturer Branson
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Reservations No upcoming reservations at this time.
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Logs
Thu, Sep 17, 2020
1:30 pm - 2:00 pm
Carl Brando
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Abrahams-
Thu, Sep 17, 2020
11:45 am - 12:00 pm
Jacqueline Hines
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Abrahams-
Wed, Sep 16, 2020
11:00 am - 11:30 am
Carl Brando
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Abrahams-
Tue, Sep 15, 2020
11:00 am - 11:30 am
Carl Brando
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Abrahams-
Fri, Sep 11, 2020
1:00 pm - 1:15 pm
Carl Brando
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Abrahams-
Records to show:
SOPs
Photo-14 - SOP - Branson Photoresist Stripper.pdf (593.24 KB)
index.php (38 B)
Manuals

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Recipes

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