May 21, 2022 UMD Home NanoCenter AIMLab
Back to Equipment List Branson Barrel Resist Stripper
Description

The Branson Barrel Photoresist Stripper is used to remove photoresist residue by means of an oxygen plasma. The Branson minimizes substrate damage.

To save wear and tear, excessive chamber cleaning and tool availability of our ICP etchers, please use the Branson rather than the Oxford tools for all photoresist descum etches.

Location FabLab | Photo Tunnel
Manufacturer Branson
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Reservations No upcoming reservations at this time.
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Logs
Wed, Oct 14, 2020
8:45 am - 9:00 am
Ashley Chapin
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Mon, Oct 12, 2020
8:00 am - 8:30 am
Ashley Chapin
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Thu, Oct 08, 2020
9:00 am - 9:30 am
Ashley Chapin
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Deleted by: Mark Lecates

Thu, Sep 17, 2020
1:30 pm - 2:00 pm
Carl Brando
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Abrahams-
Thu, Sep 17, 2020
11:45 am - 12:00 pm
Jacqueline Hines
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Abrahams-
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SOPs
Photo-14 - SOP - Branson Photoresist Stripper.pdf (593.24 KB)
index.php (38 B)
Manuals

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Recipes

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