December 1, 2021 UMD Home NanoCenter AIMLab
Back to Equipment List Oxford Etcher (Fluorine)
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
Date Start End User
12/02/2021 10:00 AM 11:00 AM Mark Lecates

Please login to make a reservation.
Thu, Dec 02, 2021
10:00 am - 11:00 am
Mark Lecates
View Reservation
Tue, Nov 30, 2021
10:30 am - 11:00 am
Michael Barrow
View Reservation
Mon, Nov 29, 2021
11:45 am - 12:00 pm
Mitchell Gross
View Reservation
Tue, Nov 23, 2021
1:00 pm - 9:00 pm
Mark Lecates
View Reservation
Tue, Nov 23, 2021
10:00 am - 10:30 am
Joseph Brock
View Reservation

Deleted by: Joseph Brock

Records to show:
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)

You must have reservation permissions to view the manuals. Please login to view manuals.


NanoCenter Group NanoCenter

Communicate Director: John Abrahams
Contact the Webmaster

Links Logos
Privacy Policy

Copyright The University of Maryland University of Maryland
2004-2021 Privacy Policy