October 14, 2025 UMD Home NanoCenter AIM Lab
Back to Equipment List Oxford Etcher (Fluorine)
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
No Charge
$0/hr
Reservations
Date Start End User
10/14/2025 12:00 PM 12:30 PM Mitchell Gross
10/14/2025 02:30 PM 03:30 PM Yang Zhang
10/15/2025 10:30 AM 11:45 AM Maxwell Xuan

Please login to make a reservation.
External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Logs
Wed, Oct 15, 2025
10:30 am - 11:45 am
Maxwell Xuan
View Reservation
Tue, Oct 14, 2025
2:30 pm - 3:30 pm
Yang Zhang
View Reservation
Tue, Oct 14, 2025
12:00 pm - 12:30 pm
Mitchell Gross
View Reservation
Mon, Oct 13, 2025
2:00 pm - 3:00 pm
Purbita Purkayastha
View Reservation
Mon, Oct 13, 2025
12:30 pm - 12:45 pm
Yixiao Wang
View Reservation
Records to show:
SOPs
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)
Manuals

You must have reservation permissions to view the manuals. Please login to view manuals.

Recipes

NanoCenter Group NanoCenter
FabLab
AIM Lab

Communicate Director: Dr. Nam Kim
Contact the Webmaster

Links Logos
Privacy Policy
Sitemap

Copyright The University of Maryland University of Maryland
2004-2025
Privacy Policy
Sitemap