September 25, 2020 UMD Home NanoCenter AIMLab
Back to Equipment List Oxford Etcher (Fluorine)
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
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Thu, Mar 19, 2020
12:45 pm - 1:00 pm
Mitchell Gross
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Thu, Mar 19, 2020
8:00 am - 11:30 am
Thomas Hutchens
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10 runs
Wed, Mar 18, 2020
1:00 pm - 2:30 pm
Sarit Zhukovsky
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Deleted by: Sarit Zhukovsky

Wed, Mar 18, 2020
11:30 am - 12:00 pm
Aysanew Abate
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Wed, Mar 18, 2020
7:00 am - 11:30 am
Mark Lecates
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Records to show:
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)

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