December 1, 2021 UMD Home NanoCenter AIMLab
Back to Equipment List Oxford Etcher (Fluorine)
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Reservations
Date Start End User
12/02/2021 10:00 AM 11:00 AM Mark Lecates

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Logs
Thu, Dec 02, 2021
10:00 am - 11:00 am
Mark Lecates
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Tue, Nov 30, 2021
10:30 am - 11:00 am
Michael Barrow
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Mon, Nov 29, 2021
11:45 am - 12:00 pm
Mitchell Gross
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Tue, Nov 23, 2021
1:00 pm - 9:00 pm
Mark Lecates
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Tue, Nov 23, 2021
10:00 am - 10:30 am
Joseph Brock
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Deleted by: Joseph Brock

Records to show:
SOPs
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)
Manuals

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Recipes

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