May 21, 2022 UMD Home NanoCenter AIMLab
Back to Equipment List Oxford Etcher (Fluorine)
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
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Thu, May 19, 2022
8:00 am - 9:30 am
Mark Lecates
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Wed, May 18, 2022
10:15 am - 10:30 am
Jiahao Zhan
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Wed, May 18, 2022
7:00 am - 8:00 am
Mark Lecates
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Tue, May 17, 2022
12:45 pm - 2:00 pm
Sam Harper
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Tue, May 17, 2022
7:00 am - 9:00 am
Mark Lecates
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Records to show:
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)

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