July 1, 2025 UMD Home NanoCenter AIM Lab
Back to Equipment List Oxford Etcher (Fluorine)
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
No Charge
$0/hr
Reservations
Date Start End User
07/01/2025 10:30 AM 11:30 AM Maxwell Xuan
07/01/2025 12:00 PM 12:45 PM Ryan Purcell
07/01/2025 02:00 PM 03:00 PM Gregory Babic

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External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Logs
Tue, Jul 01, 2025
2:00 pm - 3:00 pm
Gregory Babic
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Tue, Jul 01, 2025
12:00 pm - 12:45 pm
Ryan Purcell
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Tue, Jul 01, 2025
10:30 am - 11:30 am
Maxwell Xuan
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Tue, Jul 01, 2025
8:30 am - 9:00 am
Sean O'Leary
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Deleted by: Sean O'Leary

Mon, Jun 30, 2025
4:45 pm - 5:00 pm
Sheng-Wei Wang
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Records to show:
SOPs
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)
Manuals

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Recipes

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FabLab
AIM Lab

Communicate Director: Dr. Nam Kim
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