November 28, 2021 UMD Home NanoCenter AIMLab
Back to Equipment List MA-4 Suss Mask Aligner
Description The Karl Suss MA-4 Mask Aligner is used with substrates up to 4" (100mm) in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below. This system also offers real-time infrared through-wafer backside alignment.
Location FabLab | Photo Tunnel
Manufacturer Karl Suss MA-4
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
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Logs
Fri, Nov 19, 2021
11:00 am - 11:45 am
Harsimranjit Singh
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Wed, Nov 17, 2021
11:30 am - 12:00 pm
Mitchell Gross
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Tue, Nov 16, 2021
5:00 pm - 5:30 pm
Alisa White
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Tue, Nov 16, 2021
3:00 pm - 3:30 pm
Alisa White
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Tue, Nov 16, 2021
2:00 pm - 2:30 pm
Alisa White
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Records to show:
SOPs
MA- 4 Operating Instructions.pdf (21.04 MB)
index.php (38 B)
Manuals

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Recipes

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