September 26, 2017 UMD Home NanoCenter AIMLab
Back to Equipment List MA-4 Suss Mask Aligner
Description The Karl Suss MA-4 Mask Aligner is used with substrates up to 4" (100mm) in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below. This system also offers real-time infrared through-wafer backside alignment.
Location FabLab | Photo Tunnel
Manufacturer Karl Suss MA-4
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Discussion Link Lithography Discussion Page
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Thu, Aug 31, 2017
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Training on MA-4
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SOPs
MA- 4 Operating Instructions.pdf (21.04 MB)
index.php (38 B)
Manuals

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Recipes

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