March 29, 2024 UMD Home NanoCenter AIMLab
Description The Trion RIE is used to remove photoresist residue. Plumbed with O2,CF4,CHF3 and Sf6 the Etcher is an aggressive etcher for any organic material. Can be used to etch thin layers of SiO2 ,SiN and Si
Location FabLab | ETCH Tunnel
Manufacturer
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$81/hr
External Non-profit / University
$126/hr
Small Commercial / MTECH
$166/hr
Large Commercial
$242/hr
No Charge
$0/hr
Reservations
Date Start End User
03/29/2024 11:30 AM 12:30 PM Steven Douglass

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External Materials

If you plan to bring external materials into the lab, please notify the FabLab staff to ensure proper safety protocols and any equipment arrangements can be made ahead of your reservation. Please submit an External Materials Request form for each material you will bring.

Logs
Fri, Mar 29, 2024
11:30 am - 12:30 pm
Steven Douglass
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Thu, Mar 28, 2024
10:15 am - 10:30 am
Seungyeop Lee
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Tue, Mar 26, 2024
1:15 pm - 1:30 pm
Seungyeop Lee
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Mon, Mar 25, 2024
1:00 pm - 1:30 pm
ZhuangEn Fu
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Wed, Mar 20, 2024
9:00 am - 10:00 am
Steven Hong
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Steven
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