September 25, 2020 UMD Home NanoCenter AIMLab
Description The Trion RIE is used to remove photoresist residue. Plumbed with O2,CF4,CHF3 and Sf6 the Etcher is an aggressive etcher for any organic material. Can be used to etch thin layers of SiO2 ,SiN and Si
Location FabLab | ETCH Tunnel
Manufacturer
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Reservations
Date Start End User
09/28/2020 11:45 AM 12:00 PM Soaram Kim

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Mon, Sep 28, 2020
11:45 am - 12:00 pm
Soaram Kim
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mark
Fri, Sep 25, 2020
12:15 pm - 12:30 pm
Daniel Lewis
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Abrahams-
Fri, Sep 25, 2020
8:00 am - 9:00 am
Sean O'Leary
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Thu, Sep 24, 2020
2:45 pm - 3:15 pm
Niloy Acharjee
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mark
Thu, Sep 24, 2020
11:45 am - 12:30 pm
Sandesh Kalantre
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