December 13, 2018 UMD Home FabLab AIMLab
Back to Equipment List Oxford PECVD
Description This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
  • SiO2 (both TEOS and SiH4-based)
  • SiNx
  • SiON
  • Α - Si
Location FabLab | CVD Tunnel
Manufacturer Oxford Instruments PlasmaLab System 100
Link
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations
Date Start End User
12/13/2018 10:30 AM 12:00 PM Mijin Kim
Logs
Thu, Dec 13, 2018
10:30 am - 12:00 pm
Mijin Kim
View Reservation
Wed, Dec 12, 2018
9:00 pm - 10:00 pm
Yiwen Hu
View Reservation
Wed, Dec 12, 2018
3:30 pm - 4:30 pm
Yiwen Hu
View Reservation
Wed, Dec 12, 2018
1:30 pm - 2:00 pm
Aysanew Abate
View Reservation
Wed, Dec 12, 2018
5:30 am - 5:45 am
Mitchell Gross
View Reservation
Records to show:
SOPs
Oxford PECVD SOP.pdf (709.05 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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