| Description |
This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
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| Location | FabLab |
CVD Tunnel
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| Manufacturer |
Oxford Instruments PlasmaLab System 100 Link |
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| Staff Contact |
 Thomas Loughrantcl@umd.edu 301-405-3642 |
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| Rates | UMD $71/hr External Non-profit / University $108/hr Small Commercial / MTECH $150/hr Large Commercial $200/hr |
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| Reservations |
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| Logs |
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| SOPs |
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| Manuals | You must have lab permissions to view the manuals. Please login to view manuals or contact the lab staff to obtain permissions. |
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| Recipes | PECVD RecipesHigh Quality SiON PECVD.tif (96.05 KB)High Qulaity SiO2 PECVD.tif (78.22 KB) SiNx PECVD.tif (102.04 KB) TEOS based SiO2 PECVD.tif (100.2 KB) a-Si PECVD.tif (74.76 KB) a-Si_PECVD.txt (845 B) |
