December 1, 2021 UMD Home FabLab AIMLab
Oxford PECVD Back to Equipment List
Operational Status ● Online
Description This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
  • SiO2 (both TEOS and SiH4-based)
  • SiNx
  • SiON
  • Α - Si
Location FabLab | CVD Tunnel
Manufacturer Oxford Instruments PlasmaLab System 100
Staff Contact ThomasThomas Loughran
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
Wed, Dec 01, 2021
- 4:00 pm
Thomas Loughran
View Reservation
Throttle valve repair.
Tue, Nov 30, 2021
9:00 am - 10:00 am
Sean O'Leary
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Deleted by: Sean O'Leary

Tue, Nov 23, 2021
7:00 am - 11:45 am
Thomas Loughran
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off line
Mon, Nov 22, 2021
3:15 pm - 4:00 pm
Yuxi Jiang
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SiN deposition
Mon, Nov 22, 2021
10:15 am - 11:15 am
Jiahao Zhan
View Reservation
Records to show:
Oxford PECVD SOP.pdf (709.05 KB)
index.php (38 B)

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Colleges A. James Clark School of Engineering
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