July 18, 2025 UMD Home FabLab AIM Lab
Oxford PECVD Back to Equipment List
Operational Status ● Online
Description This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
  • SiO2 (both TEOS and SiH4-based)
  • SiNx
  • SiON
  • Α - Si
Location FabLab | CVD Tunnel
Manufacturer Oxford Instruments PlasmaLab System 100
Link
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
No Charge
$0/hr
Reservations No upcoming reservations at this time.
Logs
Fri, Jul 18, 2025
7:15 pm - 8:00 pm
Ahmed Shadman Alam
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Fri, Jul 18, 2025
3:15 pm - 4:30 pm
Ahmed Shadman Alam
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Tue, Jul 15, 2025
1:30 pm - 3:15 pm
Ahmed Shadman Alam
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Tue, Jul 15, 2025
10:30 am - 11:00 am
Ahmed Shadman Alam
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Mon, Jul 14, 2025
11:00 am - 12:00 pm
Ahmed Shadman Alam
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Deleted by: Mark Lecates

Records to show:
SOPs
Oxford PECVD SOP.pdf (709.05 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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