This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
|Location||FabLab | CVD Tunnel|
Oxford Instruments PlasmaLab System 100
External Non-profit / University
Small Commercial / MTECH
|Reservations||No upcoming reservations at this time.
Please login to make a reservation.
You must have lab permissions to view the manuals.
Please login to view manuals or contact the lab staff to obtain permissions.