No low temperature depositions and/or long exposure to precursors without explicit permission.
The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Vanadium Oxide, Titanium Nitride and Zinc Oxide deposition.
*** ATTENTION- please put the type of precursor you are using in the notes when making reservations- i.e., Al2O3, V2O5 etc. ****
Aluminum, Zinc and Titanium Oxide runs will be charged at rates of the first four hours standard rates ($71/hour for UMD use, $108 Non- profit/University, $150- Small commercial, $200- Large commercial) followed by $35/hour after that.Vanadium Oxides at standard rates ($71/hour for UMD- see above for other organizations) for TWO hours then $10/hour for the remaining.
Warning: This system uses flammable materials such as Tri-Methyl Aluminum and DiEthyl Zinc which are highly pyrophoric.
Operation is limited to users approved and trained by FabLab staff.
|Location||FabLab | CVD Tunnel|
Beneq TFS 500 ALD
External Non-profit / University
Small Commercial / MTECH
|Reservations||No upcoming reservations at this time.|
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