December 9, 2018 UMD Home FabLab AIMLab
Back to Equipment List Atomic Layer Deposition System
Description No low temperature depositions and/or long exposure to precursors without explicit permission. The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Vanadium Oxide, Titanium Nitride and Zinc Oxide deposition. Warning: This system uses flammable materials such as Tri-Methyl Aluminum. Operation is limited to users approved and trained by FabLab staff.
Location FabLab | CVD Tunnel
Manufacturer Beneq TFS 500 ALD
Link
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
Logs
Thu, Dec 06, 2018
4:30 pm - 5:00 pm
Yonggang Yao
View Reservation
Thu, Dec 06, 2018
2:45 pm - 3:15 pm
Hanyu Liu
View Reservation
Wed, Dec 05, 2018
1:00 pm - 1:15 pm
Ethan Hyde
View Reservation
Fri, Nov 30, 2018
3:00 pm - 3:45 pm
Hanyu Liu
View Reservation
Fri, Nov 30, 2018
6:30 am - 10:00 am
John Abrahams
View Reservation
Change TMA cylinders
Records to show:
SOPs
cvd-03_TFS_500_ALD_System_overview.pdf (1.02 MB)
cvd-03_tfs_500_tech_sheet.pdf (183.77 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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