|Description||No low temperature depositions and/or long exposure to precurors without explicit permission. All precursors are usable at this time. The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Vanadium Oxide, Titanium Nitride and Zinc Oxide deposition. Warning: This system uses flammable materials such as Tri-Methyl Aluminum. Operation is limited to users approved and trained by FabLab staff.|
|Location||FabLab | CVD Tunnel|
Beneq TFS 500 ALD
External Non-profit / University
Small Commercial / MTECH
|Reservations||No upcoming reservations at this time.|
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