December 9, 2018 UMD Home FabLab AIMLab
Back to Equipment List Atomic Layer Deposition System
Description No low temperature depositions and/or long exposure to precursors without explicit permission. The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Vanadium Oxide, Titanium Nitride and Zinc Oxide deposition. Warning: This system uses flammable materials such as Tri-Methyl Aluminum. Operation is limited to users approved and trained by FabLab staff.
Location FabLab | CVD Tunnel
Manufacturer Beneq TFS 500 ALD
Staff Contact JohnJohn Abrahams
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
Thu, Dec 06, 2018
4:30 pm - 5:00 pm
Yonggang Yao
View Reservation
Thu, Dec 06, 2018
2:45 pm - 3:15 pm
Hanyu Liu
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Wed, Dec 05, 2018
1:00 pm - 1:15 pm
Ethan Hyde
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Fri, Nov 30, 2018
3:00 pm - 3:45 pm
Hanyu Liu
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Fri, Nov 30, 2018
6:30 am - 10:00 am
John Abrahams
View Reservation
Change TMA cylinders
Records to show:
cvd-03_TFS_500_ALD_System_overview.pdf (1.02 MB)
cvd-03_tfs_500_tech_sheet.pdf (183.77 KB)
index.php (38 B)

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