July 9, 2020 UMD Home FabLab AIMLab
Back to Equipment List Atomic Layer Deposition System

No low temperature depositions and/or long exposure to precursors without explicit permission Do NOT open door to cool off system quickly. You need to tell FABLAB Staff to turn the temperature down 24 hours BEFORE you want to run.

The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Vanadium Oxide, Titanium Nitride and Zinc Oxide deposition.

*** ATTENTION- please put the type of precursor you are using in the notes when making reservations- i.e., Al2O3, V2O5 etc. ****

Aluminum, Zinc and Titanium Oxide runs will be charged at rates of the first four hours standard rates ($71/hour for UMD use, $108 Non- profit/University, $150- Small commercial, $200- Large commercial) followed by $35/hour after that.

Vanadium Oxides at standard rates ($71/hour for UMD- see above for other organizations) for TWO hours then $10/hour for the remaining.

Warning: This system uses flammable materials such as Tri-Methyl Aluminum and DiEthyl Zinc which are highly pyrophoric.

Operation is limited to users approved and trained by FabLab staff.

Location FabLab | CVD Tunnel
Manufacturer Beneq TFS 500 ALD
Staff Contact JohnJohn Abrahams
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Date Start End User
07/10/2020 09:30 AM 10:00 AM Carl Brando
Fri, Jul 10, 2020
9:30 am - 10:00 am
Carl Brando
View Reservation
Tue, Jul 07, 2020
9:00 am - 10:00 am
Yevgeniy Ostrovskiy
View Reservation
Abrahams- ALD- ZnO
Wed, Jul 01, 2020
10:00 am - 12:00 pm
Jijian Xu
View Reservation
Abrahams- Running 4 runs of Al2O3 on LiCl/Graphite 2 nm, 4 nm, 6 nm
Tue, Jun 30, 2020
10:00 am - 12:00 pm
George Caceres
View Reservation
Abrahams- George running TiN
Fri, Jun 26, 2020
1:00 pm - 2:00 pm
Yonggang Yao
View Reservation
Abrahams- Yonggang running Al2O3 150 C
Records to show:
cvd-03_TFS_500_ALD_System_overview.pdf (1.02 MB)
cvd-03_tfs_500_tech_sheet.pdf (183.77 KB)
index.php (38 B)

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