April 3, 2020 UMD Home FabLab AIMLab
Back to Equipment List Atomic Layer Deposition System

No low temperature depositions and/or long exposure to precursors without explicit permission.

The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Vanadium Oxide, Titanium Nitride and Zinc Oxide deposition.

*** ATTENTION- please put the type of precursor you are using in the notes when making reservations- i.e., Al2O3, V2O5 etc. ****

Aluminum, Zinc and Titanium Oxide runs will be charged at rates of the first four hours standard rates ($71/hour for UMD use, $108 Non- profit/University, $150- Small commercial, $200- Large commercial) followed by $35/hour after that.

Vanadium Oxides at standard rates ($71/hour for UMD- see above for other organizations) for TWO hours then $10/hour for the remaining.

Warning: This system uses flammable materials such as Tri-Methyl Aluminum and DiEthyl Zinc which are highly pyrophoric.

Operation is limited to users approved and trained by FabLab staff.

Location FabLab | CVD Tunnel
Manufacturer Beneq TFS 500 ALD
Staff Contact JohnJohn Abrahams
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
Wed, Mar 18, 2020
9:30 am - 1:00 pm
John Abrahams
View Reservation
Training Feng Niu
Tue, Mar 17, 2020
10:00 pm - 10:30 pm
Yonggang Yao
View Reservation
Mon, Mar 16, 2020
1:30 pm - 2:00 pm
Xiyuan Cheng
View Reservation
Fri, Mar 13, 2020
10:30 am - 11:00 am
Xiyuan Cheng
View Reservation
Tue, Mar 10, 2020
8:00 am - 3:00 pm
John Abrahams
View Reservation
Records to show:
cvd-03_TFS_500_ALD_System_overview.pdf (1.02 MB)
cvd-03_tfs_500_tech_sheet.pdf (183.77 KB)
index.php (38 B)

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