September 23, 2018 UMD Home FabLab AIMLab
Back to Equipment List Atomic Layer Deposition System
Description No low temperature depositions and/or long exposure to precurors without explicit permission. All precursors are usable at this time. The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Vanadium Oxide, Titanium Nitride and Zinc Oxide deposition. Warning: This system uses flammable materials such as Tri-Methyl Aluminum. Operation is limited to users approved and trained by FabLab staff.
Location FabLab | CVD Tunnel
Manufacturer Beneq TFS 500 ALD
Link
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$230/hr
Reservations No upcoming reservations at this time.
Logs
Wed, Sep 19, 2018
10:30 am - 12:15 pm
John Abrahams
View Reservation
Training Alireza Pesaran
Mon, Sep 17, 2018
1:15 pm - 2:00 pm
Chao Luo
View Reservation
Thu, Sep 13, 2018
10:00 am - 11:00 am
Mustafa Buyukkaya
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Thu, Sep 13, 2018
8:00 am - 10:00 am
John Abrahams
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Clean trap and general check.
Wed, Sep 12, 2018
1:00 pm - 1:30 pm
John Abrahams
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Training Eugene Ostrovskiy with TiO2 Note: need revision of information from inactive account.
Records to show:
SOPs
cvd-03_TFS_500_ALD_System_overview.pdf (1.02 MB)
cvd-03_tfs_500_tech_sheet.pdf (183.77 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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