September 23, 2018 UMD Home FabLab AIMLab
Back to Equipment List Atomic Layer Deposition System
Description No low temperature depositions and/or long exposure to precurors without explicit permission. All precursors are usable at this time. The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Vanadium Oxide, Titanium Nitride and Zinc Oxide deposition. Warning: This system uses flammable materials such as Tri-Methyl Aluminum. Operation is limited to users approved and trained by FabLab staff.
Location FabLab | CVD Tunnel
Manufacturer Beneq TFS 500 ALD
Staff Contact JohnJohn Abrahams
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
Wed, Sep 19, 2018
10:30 am - 12:15 pm
John Abrahams
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Training Alireza Pesaran
Mon, Sep 17, 2018
1:15 pm - 2:00 pm
Chao Luo
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Thu, Sep 13, 2018
10:00 am - 11:00 am
Mustafa Buyukkaya
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Thu, Sep 13, 2018
8:00 am - 10:00 am
John Abrahams
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Clean trap and general check.
Wed, Sep 12, 2018
1:00 pm - 1:30 pm
John Abrahams
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Training Eugene Ostrovskiy with TiO2 Note: need revision of information from inactive account.
Records to show:
cvd-03_TFS_500_ALD_System_overview.pdf (1.02 MB)
cvd-03_tfs_500_tech_sheet.pdf (183.77 KB)
index.php (38 B)

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