No low temperature depositions and/or long exposure to precursors without explicit permission Do NOT open door to cool off system quickly. You need to tell FABLAB Staff to turn the temperature down 24 hours BEFORE you want to run.
The Beneq Atomic Layer Deposition system in FabLab is currently configured for Aluminum Oxide, Titanium Oxide, Vanadium Oxide, Titanium Nitride and Zinc Oxide deposition.
*** ATTENTION- please put the type of precursor you are using in the notes when making reservations- i.e., Al2O3, V2O5 etc. ****
Aluminum, Zinc and Titanium Oxide runs will be charged at rates of the first four hours standard rates ($71/hour for UMD use, $108 Non- profit/University, $150- Small commercial, $200- Large commercial) followed by $35/hour after that.Vanadium Oxides at standard rates ($71/hour for UMD- see above for other organizations) for TWO hours then $10/hour for the remaining.
Warning: This system uses flammable materials such as Tri-Methyl Aluminum and DiEthyl Zinc which are highly pyrophoric.
Operation is limited to users approved and trained by FabLab staff.
|Location||FabLab | CVD Tunnel|
Beneq TFS 500 ALD
External Non-profit / University
Small Commercial / MTECH
You must have lab permissions to view the manuals.
Please login to view manuals or contact the lab staff to obtain permissions.