July 9, 2020 UMD Home FabLab AIMLab
Back to Equipment List EVG 620 Mask Aligner
Description The EVG is stumbling on occasion. Let FABLAB staff know if you are having problems with performance. John Abrahams can train on the Suss MA-4 if necessary. Note: bulb changed 8-8-2019! Intensity is now 15 mw/cm2

Do NOT turn off after use, use SO use the new track ball and left button


The EVG 620 is a two-sided contact alignment and exposure tool. It is configured for 3", 4" and 6" wafers only. Its minimum achievable feature size is approximately one micron.


The EVG 620 is fitted with a special fixture which facilitates precise registration of two wafers in the aligner prior to using the EVG 01 Wafer Bonder.

Location FabLab | Photo Tunnel
Manufacturer EVG 620
Staff Contact JohnJohn Abrahams
jabrah@umd.edu
301-405-6664
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
Logs
Tue, Sep 24, 2019
4:00 pm - 4:15 pm
Michael Yeh
View Reservation
Mon, Sep 16, 2019
11:30 am - 11:45 am
Mitchell Gross
View Reservation

Deleted by: Mitchell Gross

Mon, Sep 09, 2019
9:00 am - 9:30 am
Mitchell Gross
View Reservation
Wed, Sep 04, 2019
10:00 am - 11:00 am
John Abrahams
View Reservation
Training Allie Elyahb Kwizera
Tue, Sep 03, 2019
1:30 pm - 1:45 pm
Mitchell Gross
View Reservation
Records to show:
SOPs
620Bondalign.pdf (1.01 MB)
620Lithography.pdf (995.56 KB)
index.php (38 B)
photo-05_sop_EVG620_mask_aligner.pdf (86.36 KB)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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