July 9, 2020 UMD Home FabLab AIMLab
Back to Equipment List MJB-3 Mask aligner- right of spin station #1
Description The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below.
Location FabLab | Teaching Lab
Manufacturer Karl Suss America Inc. MJB-3
Staff Contact JohnJohn Abrahams
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
Thu, Jul 09, 2020
11:00 am - 1:00 pm
Xinjun wang
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Tue, Jun 30, 2020
10:00 am - 12:00 pm
Xinjun wang
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Abrahams- Xinjun spinning, baking and aligning LN samples
Thu, Jun 25, 2020
12:00 pm - 1:00 pm
Xinjun wang
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Abrahams- Xinjun on MJB-3 for 10x10 mm LN
Fri, Jun 12, 2020
11:00 am - 1:00 pm
Bo Miao
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Photolith and wet etching.
Thu, Mar 12, 2020
1:00 pm - 1:15 pm
Arsalan Atta
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Records to show:
Photo-03 - SOP - MJB-3 Mask Aligner.pdf (64.6 KB)
index.php (38 B)

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