September 28, 2020 UMD Home FabLab AIMLab
Back to Equipment List Oriel Area UV Exposure System
Description Note: new bulb installed 12/13/13. Intensity is substantially higher at ~14 mW/cm2 so check your times.

The Oriel Mask Aligner is a low-resolution mask alignment system. It can handle masks and substrates as large as 6” X 6”. The system is used primarily for copying masks or for single exposures where little or no alignment is required.

Location FabLab | Photo Tunnel
Manufacturer Oriel
Staff Contact FabLab Staff
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
Thu, Jan 23, 2020
1:30 pm - 1:45 pm
Deric Session
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Wed, Jun 13, 2018
1:00 pm - 1:30 pm
Drew Stasak
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Sun, May 06, 2018
7:15 pm - 7:30 pm
Drew Stasak
View Reservation
Mon, Apr 16, 2018
1:00 pm - 1:30 pm
John Abrahams
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Thu, Mar 29, 2018
1:30 pm - 1:45 pm
Julia Sell
View Reservation
Records to show:
index.php (38 B)
photo-07_sop_Oriel_mask_aligner.pdf (69.16 KB)

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Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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