|Description||The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below. A backside alignment option is available, allowing the registration of front side to backside masks, for creating three-dimensional structures.|
|Location||FabLab | Photo Tunnel|
Karl Suss America Inc. MJB-3 w/ Backside
External Non-profit / University
Small Commercial / MTECH
|Reservations||No upcoming reservations at this time.|
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chlorobenzene_lift.doc (28.5 KB)
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shipley_1813_positive_photolithography_process.doc (27 KB)