June 24, 2018 UMD Home FabLab AIMLab
Back to Equipment List Developing Bench
Description NOTE: This Bench is for developing photoresist only. Use other wet benches for any other wet processing you need to do.

Working with wet chemicals can be hazardous if you don't follow the proper procedures at all times. Violating procedure risks not only your health but also the health and safety of other users and may result in loss of access to FabLab for an extended period of time.
Location FabLab | Photo Tunnel
Staff Contact FabLab Staff
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
Wed, Jun 20, 2018
9:30 am - 9:45 am
Abraham Chen
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Thu, Jun 14, 2018
7:30 am - 1:30 pm
Jacqueline Hines
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Deleted by: Jacqueline Hines

R1024M3 Liftoff
Wed, Jun 13, 2018
11:15 am - 3:15 pm
Jacqueline Hines
View Reservation
R1024M3 develop
Fri, Jun 01, 2018
12:45 pm - 1:00 pm
Julia Sell
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Deleted by: Julia Sell

Wed, May 16, 2018
1:00 pm - 1:15 pm
Julia Sell
View Reservation
Records to show:
index.php (38 B)
photo-10_sop_developing_bench.pdf (59.58 KB)

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