September 20, 2018 UMD Home FabLab AIMLab
Back to Equipment List Developing Bench
Description NOTE: This Bench is for developing photoresist only. Use other wet benches for any other wet processing you need to do.

Working with wet chemicals can be hazardous if you don't follow the proper procedures at all times. Violating procedure risks not only your health but also the health and safety of other users and may result in loss of access to FabLab for an extended period of time.
Location FabLab | Photo Tunnel
Staff Contact FabLab Staff
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
Mon, Sep 10, 2018
11:45 am - 12:00 pm
Zhouchen Luo
View Reservation
Wed, Aug 01, 2018
11:45 am - 12:15 pm
Adam Friedman
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Thu, Jul 26, 2018
2:15 pm - 2:30 pm
Julia Sell
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Thu, Jul 19, 2018
2:15 pm - 2:30 pm
Michael Yeh
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Tue, Jul 10, 2018
4:15 pm - 4:45 pm
Xiaohang Zhang
View Reservation
Records to show:
index.php (38 B)
photo-10_sop_developing_bench.pdf (59.58 KB)

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