July 9, 2020 UMD Home FabLab AIMLab
Back to Equipment List Developing Bench
Description NOTE: This Bench is for developing photoresist only. Use other wet benches for any other wet processing you need to do.

Working with wet chemicals can be hazardous if you don't follow the proper procedures at all times. Violating procedure risks not only your health but also the health and safety of other users and may result in loss of access to FabLab for an extended period of time.
Location FabLab | Photo Tunnel
Staff Contact FabLab Staff
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
Wed, Jul 08, 2020
11:00 am - 11:45 am
Carl Brando
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Fri, Jun 19, 2020
10:30 am - 10:45 am
Uday Saha
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Thu, Jun 18, 2020
11:00 am - 11:15 am
Sam Harper
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Deleted by: Mark Lecates

Fri, Jun 12, 2020
11:45 am - 12:15 pm
Carl Brando
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Abrahams- Carl developing and hard bake resist
Thu, Jun 11, 2020
10:30 am - 11:00 am
Carl Brando
View Reservation
Abrahams- Carl developing wafers for Graphene etching.
Records to show:
index.php (38 B)
photo-10_sop_developing_bench.pdf (59.58 KB)

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