March 21, 2018 UMD Home FabLab AIMLab
Back to Equipment List Developing Bench
Description NOTE: This Bench is for developing photoresist only. Use other wet benches for any other wet processing you need to do.

Working with wet chemicals can be hazardous if you don't follow the proper procedures at all times. Violating procedure risks not only your health but also the health and safety of other users and may result in loss of access to FabLab for an extended period of time.
Location FabLab | Photo Tunnel
Staff Contact FabLab Staff
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
Please login to make a reservation.
Wed, Feb 28, 2018
11:30 am - 12:00 pm
Aziz Karasahin
View Reservation
Fri, Feb 23, 2018
2:30 pm - 2:45 pm
Sudeep Dutta
View Reservation
Thu, Feb 22, 2018
10:00 am - 10:15 am
David Shahin
View Reservation
Wed, Feb 21, 2018
8:45 am - 9:00 am
Kelsey Gray
View Reservation
Thu, Feb 15, 2018
9:45 am - 10:00 am
Kelsey Gray
View Reservation

Deleted by: Kelsey Gray

Records to show:
index.php (38 B)
photo-10_sop_developing_bench.pdf (59.58 KB)

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.


Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

Communicate Contact Us
Contact the Webmaster
Follow us on TwitterTwitter logo

Links Privacy Policy

Copyright The University of Maryland University of Maryland