January 16, 2018 UMD Home FabLab AIMLab
Back to Equipment List Developing Bench
Description NOTE: This Bench is for developing photoresist only. Use other wet benches for any other wet processing you need to do.

Working with wet chemicals can be hazardous if you don't follow the proper procedures at all times. Violating procedure risks not only your health but also the health and safety of other users and may result in loss of access to FabLab for an extended period of time.
Location FabLab | Photo Tunnel
Manufacturer
Staff Contact FabLab Staff
fablab@umd.edu
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
Please login to make a reservation.
Logs
Thu, Jan 04, 2018
12:00 pm - 1:30 pm
Jacqueline Hines
View Reservation
C1016 M1 develop
Tue, Dec 19, 2017
5:15 pm - 5:30 pm
Jacqueline Hines
View Reservation
R1024 M1 develop
Tue, Dec 19, 2017
10:15 am - 12:45 pm
Jacqueline Hines
View Reservation
R1024M2 Develop
Mon, Dec 18, 2017
4:30 pm - 6:00 pm
Jacqueline Hines
View Reservation

Deleted by: Jacqueline Hines

Liftoff - R1024M1
Mon, Dec 18, 2017
2:15 pm - 4:45 pm
Jacqueline Hines
View Reservation
R1024 M1 develop
Records to show:
SOPs
index.php (38 B)
photo-10_sop_developing_bench.pdf (59.58 KB)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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