March 21, 2018 UMD Home FabLab AIMLab
Back to Equipment List Raith e_LiNE
Description The Raith e_line is a versatile e-beam system for nano structuring and patterning using a TFE filament for ultra high resolution capability. Patterns can be done in either stitching mode or "Fixed Beam Moving Stage" mode. FBMS eliminates stitching errors on larger structures such as wave guides.

This tool is to be used only as an Ebeam writer. For runs longer than 4-5 hours please start your run in the evening and let it run over night. If you need SEM images please see a FabLab Staff member for imaging on the Hitachi S3400N, the JEOL JSM-6400 or the NISP Lab Staff on the SU-70.

Location FabLab | Exploratory Lab
Manufacturer Raith
Staff Contact JonathanJonathan Hummel
301 405-5017
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Date Start End User
03/26/2018 12:00 PM 03:00 PM Sudeep Dutta

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Mon, Mar 26, 2018
12:00 pm - 3:00 pm
Sudeep Dutta
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Mon, Mar 19, 2018
11:30 am - 4:30 pm
Shahriar Aghaeimeibodi
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Fri, Mar 16, 2018
2:00 pm - 6:00 pm
Shahriar Aghaeimeibodi
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Fri, Mar 16, 2018
9:30 am - 11:30 am
Gang Li
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Fri, Mar 16, 2018
7:00 am - 9:30 am
Shahriar Aghaeimeibodi
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Deleted by: Shahriar Aghaeimeibodi

Records to show:
index.php (38 B)
photo-01_Info_RAITH150.pdf (309.16 KB)
photo-01_Info_e_LiNE.pdf (379.32 KB)
photo-01_application_note_FBMS.pdf (196.72 KB)
photo-01_e_LiNE_technical_description.pdf (716.67 KB)

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