December 9, 2018 UMD Home FabLab AIMLab
Back to Equipment List Raith e_LiNE
Description The Raith e_line is a versatile e-beam system for nano structuring, patterning and imaging using a Thermal Field Emission filament for ultra high resolution capability. Patterns can be done in either stitching mode or "Fixed Beam Moving Stage" mode. FBMS eliminates stitching errors on larger structures such as wave guides that can range over multiple millimeter distances. The electron column has a unique cross over free beam path that give high beam current and exceedingly low aberrations for top quality patterning and unsurpassed low voltage imaging even below 1keV.

For runs longer than 4-5 hours please start your run in the evening and let it run over night.

Location FabLab | Exploratory Lab SEM room
Manufacturer Raith
Staff Contact JonathanJonathan Hummel
301 405-5017
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Date Start End User
12/10/2018 11:00 AM 01:00 PM Thomas Farinha
Mon, Dec 10, 2018
11:00 am - 1:00 pm
Thomas Farinha
View Reservation
Patterning on PMMA/Si
Fri, Dec 07, 2018
7:30 am - 9:30 am
Benjamin Barnes
View Reservation
Thu, Dec 06, 2018
5:00 pm - 8:00 pm
Jongbum Kim
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Wed, Dec 05, 2018
3:30 pm - 5:30 pm
Gang Li
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Tue, Dec 04, 2018
4:00 pm - 8:00 pm
Shahriar Aghaeimeibodi
View Reservation
Records to show:
index.php (38 B)
photo-01_Info_RAITH150.pdf (309.16 KB)
photo-01_Info_e_LiNE.pdf (379.32 KB)
photo-01_application_note_FBMS.pdf (196.72 KB)
photo-01_e_LiNE_technical_description.pdf (716.67 KB)

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