The Tystar furnace has three dedicated tubes for the growth/deposition of:gate-quality silicon dioxide,LPCVD polysilicon,LPCVD silicon nitride
The furnace tubes can accommodate batches of up to 25 three or four inch silicon wafers per run. Virgin silicon wafers only please! Furnace is for FabLab staff use only.
30 minute minimum charge
|Location||FabLab | CVD Tunnel|
External Non-profit / University
Small Commercial / MTECH
|Reservations||No upcoming reservations at this time.|
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