September 28, 2020 UMD Home FabLab AIMLab
Back to Equipment List Critical Point Dryer
Description

The Supercritical Point Dryer anti-stiction release system increases both yield and uniformity of MEMS devices. Carbon dioxide is used as the transitional dry release fluid following wet etching steps. Auto-Process up to 5 - 4" wafers in less than 1 hour.

Location FabLab | ETCH Tunnel
Manufacturer
Staff Contact JonathanJonathan Hummel
jhummel1@umd.edu
301 405-5017
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
Logs
Fri, Feb 21, 2020
6:00 pm - 6:30 pm
Fan Yu
View Reservation
Thu, Feb 20, 2020
4:00 pm - 6:00 pm
Fan Yu
View Reservation
Thu, Jan 30, 2020
8:45 am - 9:30 am
Benjamin Barnes
View Reservation
Tue, Jan 28, 2020
4:30 pm - 5:15 pm
Benjamin Barnes
View Reservation
Tue, Jan 07, 2020
5:15 pm - 6:00 pm
Benjamin Barnes
View Reservation
Records to show:
SOPs
Etch -13 Supercritical Point Dryer SOP.pdf (1.88 MB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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