August 19, 2022 UMD Home FabLab AIMLab
Critical Point Dryer Back to Equipment List
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The Supercritical Point Dryer anti-stiction release system increases both yield and uniformity of MEMS devices. Carbon dioxide is used as the transitional dry release fluid following wet etching steps. Auto-Process up to 5 - 4" wafers in less than 1 hour.

Location FabLab | ETCH Tunnel
Staff Contact JonathanJonathan Hummel
301 405-5017
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
Fri, May 06, 2022
10:30 am - 11:30 am
Benjamin Barnes
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Fri, May 06, 2022
9:00 am - 10:00 am
Mustafa Buyukkaya
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Thu, Apr 07, 2022
11:30 am - 12:30 pm
Harjot Singh
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Thu, Mar 31, 2022
10:00 am - 11:00 am
Mustafa Buyukkaya
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Thu, Nov 04, 2021
- 1:30 am
Sangyoon Kim
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Records to show:
Etch -13 Supercritical Point Dryer SOP.pdf (1.88 MB)
index.php (38 B)

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Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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