September 20, 2018 UMD Home FabLab AIMLab
Back to Equipment List Tescan XEIA Plasma FIB/SEM

The world's first fully integrated Xe plasma source FIB with SEM enables extremely high ion currents up to 2.5 μA thus increasing sputtering rate more than 50 times compared to conventional Ga source FIB. This predetermines XEIA for milling big volumes of materials that were time consuming or impossible in the past.

The XEIA is a fully PC controlled SEM with Schottky field emission cathode in combination with Xe Plasma Focused Ion Beam (SEM-FIB) column and also fully equipped with Gas Injection System (GIS) for five different gases. With more than 20 ports in the newly designed large sample chamber, the XEIA also integrates a variety of nano-analytical capabilities in one single instrument. The XEIA equipped with:

  • EDS (Energy Dispersive X-Ray Spectrometry)
  • CL (Cathodoluminescence)
For External nonprofit/university users: 1st 10 hours in a billing cycle will be billed at $137/hour; any additional hours in that same billing cycle will be billed at $110/hour
Location AIM Lab | 1237E Kim Eng. Bldg.
Staff Contact Wen-AnWen-An Chiou
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
Wed, Sep 05, 2018
9:00 am - 12:00 pm
Fudong Han
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FIB cross-section with 300 micron depth / JCRao
Mon, Aug 27, 2018
3:00 pm - 4:00 pm
Tanner Hamann
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Mon, Aug 27, 2018
11:00 am - 3:00 pm
Tanner Hamann
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Mon, Aug 27, 2018
9:00 am - 1:00 pm
Tanner Hamann
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Deleted by: Jiancun Rao

TEM lamella rough milling partially assisted by JCRao
Thu, Aug 23, 2018
9:00 am - 1:00 pm
Jake Steiner
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TEM lamella / JCRao
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