December 1, 2021 UMD Home FabLab AIMLab
MJB-3 Mask Aligner- Left of spin station #2 Back to Equipment List
Operational Status ‚óŹ Online
Description The Karl Suss MJB-3 Mask Aligner is used with substrates up to 3" in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists.
Location FabLab | Teaching Lab
Staff Contact FabLab Staff
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
Thu, Nov 18, 2021
9:30 am - 10:00 am
Emma Huckestein
View Reservation
Expose 3 in mask of various MW antennas onto a 3 in sapphire wafer coated in 10 nm Cr and 300 nm Au.
Wed, Nov 17, 2021
10:00 am - 10:30 am
Emma Huckestein
View Reservation

Deleted by: Emma Huckestein

Aligning mask onto 3 in sapphire wafer coated with 10 nm Cr and 300 nm gold.
Tue, Nov 09, 2021
9:00 am - 11:00 am
Mark Lecates
View Reservation
Thu, Nov 04, 2021
12:15 pm - 12:45 pm
Marco Casareto
View Reservation
Wed, Nov 03, 2021
9:00 am - 12:00 pm
Mark Lecates
View Reservation
Records to show:

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.


Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

Communicate Join Email List
Contact Us
Follow us on TwitterTwitter logo

Links Privacy Policy

Copyright The University of Maryland University of Maryland