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| Description |
This Oxford PlasmaPro 100 Cobra 300 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: Ar-O2-Sf6-BCL3-SiCl4-H2-CH4. This etcher is used primarily for etching GaAs and InP |
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| Location | FabLab |
ETCH Tunnel
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| Manufacturer |
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| Staff Contact |
 Nam Kimnsk0248@umd.edu 301-405-6664 |
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| Rates | Large Commercial $266/hr Small Commercial / MTECH $183/hr UMD $89/hr External Non-profit / University $139/hr No Charge $0/hr |
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| Logs |
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| Manuals | You must have lab permissions to view the manuals. Please login to view manuals or contact the lab staff to obtain permissions. |
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| Recipes |
