| Description |
This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include:
The standard operating procedure for this tool is loaded into the PC that supports the ICP etcher. |
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| Location | FabLab |
ETCH Tunnel
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| Manufacturer |
Oxford Instruments |
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| Staff Contact |
 Thomas Loughrantcl@umd.edu 301-405-3642 |
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| Rates | UMD $71/hr External Non-profit / University $108/hr Small Commercial / MTECH $150/hr Large Commercial $200/hr |
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| Reservations |
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| Logs |
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| SOPs |
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| Manuals | You must have lab permissions to view the manuals. Please login to view manuals or contact the lab staff to obtain permissions. |
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| Recipes | Oxford Etch RecipesAL2O3ICP180_BCl3-HBr.doc (48 KB)AlGaN_GaN Etch Recipe.tif (225.63 KB) GaAs_AlGaAs Etch Recipe.tif (277.68 KB) InP Etch Recipe.tif (223.57 KB) MgO Etch Recipe.doc (27.5 KB) |
