September 20, 2018 UMD Home FabLab AIMLab
Back to Equipment List Oxford ICP Etcher(Chlorine)
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include:
  • Cl2, O2
  • SiCl4, SF6
  • CH4, Ar
  • H2, N2
This etcher is used primarily for etching III-V materials and aluminum.

The standard operating procedure for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact ThomasThomas Loughran
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
Wed, Sep 19, 2018
10:00 am - 11:00 am
Mijin Kim
View Reservation
Wed, Sep 19, 2018
9:30 am - 9:45 am
Mijin Kim
View Reservation
Tue, Sep 18, 2018
11:00 am - 12:00 pm
Mijin Kim
View Reservation

Deleted by: Mijin Kim

Mon, Sep 17, 2018
3:00 pm - 4:30 pm
Changmin Lee
View Reservation
Fri, Sep 14, 2018
12:30 pm - 12:45 pm
Aysanew Abate
View Reservation
Records to show:
Oxford Chlorine Etcher SOP.pdf (384 KB)
index.php (38 B)

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.


Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

Communicate Contact Us
Contact the Webmaster
Follow us on TwitterTwitter logo

Links Privacy Policy

Copyright The University of Maryland University of Maryland