June 24, 2018 UMD Home FabLab AIMLab
Back to Equipment List Oxford ICP Etcher(Chlorine)
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include:
  • Cl2, O2
  • SiCl4, SF6
  • CH4, Ar
  • H2, N2
This etcher is used primarily for etching III-V materials and aluminum.

The standard operating procedure for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations
Date Start End User
06/26/2018 10:30 AM 12:30 PM Mijin Kim
06/28/2018 10:30 AM 12:00 PM Mijin Kim
Logs
Thu, Jun 28, 2018
10:30 am - 12:00 pm
Mijin Kim
View Reservation
Tue, Jun 26, 2018
10:30 am - 12:30 pm
Mijin Kim
View Reservation
Wed, Jun 20, 2018
5:15 pm - 5:30 pm
Gang Li
View Reservation
Wed, Jun 13, 2018
7:00 am - 7:30 am
Lunet Luna
View Reservation
Tue, Jun 12, 2018
4:00 pm - 4:15 pm
Gang Li
View Reservation
Records to show:
SOPs
Oxford Chlorine Etcher SOP.pdf (384 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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