December 13, 2018 UMD Home FabLab AIMLab
Back to Equipment List Oxford ICP Etcher(Chlorine)
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include:
  • Cl2, O2
  • SiCl4, SF6
  • CH4, Ar
  • H2, N2
This etcher is used primarily for etching III-V materials and aluminum.

The standard operating procedure for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact ThomasThomas Loughran
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Date Start End User
12/13/2018 09:45 AM 10:15 AM Aysanew Abate
12/13/2018 10:30 AM 12:00 PM Mijin Kim
12/18/2018 09:00 AM 04:00 PM Thomas Loughran
Tue, Dec 18, 2018
9:00 am - 4:00 pm
Thomas Loughran
View Reservation
Thu, Dec 13, 2018
10:30 am - 12:00 pm
Mijin Kim
View Reservation
Thu, Dec 13, 2018
9:45 am - 10:15 am
Aysanew Abate
View Reservation
Tue, Dec 11, 2018
10:30 am - 11:45 am
Sabyasachi Barik
View Reservation
Mon, Dec 10, 2018
4:00 pm -
Sabyasachi Barik
View Reservation
Records to show:
Oxford Chlorine Etcher SOP.pdf (384 KB)
index.php (38 B)

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.


Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

Communicate Contact Us
Contact the Webmaster
Follow us on TwitterTwitter logo

Links Privacy Policy

Copyright The University of Maryland University of Maryland