June 30, 2025 UMD Home FabLab AIM Lab
Oxford ICP Etcher(Chlorine) Back to Equipment List
Operational Status ● Online
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include:
  • Cl2, O2
  • SiCl4, SF6
  • CH4, Ar
  • H2, N2
This etcher is used primarily for etching III-V materials and aluminum.

The standard operating procedure for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact ThomasThomas Loughran
tcl@umd.edu
301-405-3642
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
No Charge
$0/hr
Reservations
Date Start End User
07/01/2025 01:30 PM 03:30 PM Leopoldo Tapia-Aracayo
07/01/2025 03:30 PM 05:00 PM Ghadah Alshalan
Logs
Tue, Jul 01, 2025
3:30 pm - 5:00 pm
Ghadah Alshalan
View Reservation
Tue, Jul 01, 2025
1:30 pm - 3:30 pm
Leopoldo Tapia-Aracayo
View Reservation
Mon, Jun 30, 2025
2:30 pm - 4:00 pm
Ghadah Alshalan
View Reservation
Fri, Jun 27, 2025
1:00 pm - 2:45 pm
Leopoldo Tapia-Aracayo
View Reservation
Fri, Jun 27, 2025
11:45 am - 12:30 pm
Sean O'Leary
View Reservation
Records to show:
SOPs
Oxford Chlorine Etcher SOP.pdf (384 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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