June 24, 2018 UMD Home FabLab AIMLab
Back to Equipment List Branson Barrel Resist Stripper
Description

The Branson Barrel Photoresist Stripper is used to remove photoresist residue by means of an oxygen plasma. Much less aggressive than the FabLab March stripper, the Branson minimizes substrate damage.

To save wear and tear, excessive chamber cleaning and tool availability of our ICP etchers, please use the Branson rather than the Oxford tools for all photoresist descum etches.

Location FabLab | Photo Tunnel
Manufacturer Branson
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
Logs
Fri, Jun 22, 2018
11:15 am - 12:00 pm
Aaron Green
View Reservation
Thu, Jun 21, 2018
5:30 pm - 5:45 pm
Abraham Chen
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Thu, Jun 21, 2018
5:00 pm - 5:15 pm
Michael Van Order
View Reservation
100W Ar exposure, 5 min ON, 5 min OFF, 5 min ON to minimize overheating. Samples: (110) and (111) single crystal FeGa mounted in Bakelite (thermoset).
Thu, Jun 21, 2018
2:00 pm - 2:15 pm
Mitchell Gross
View Reservation
Thu, Jun 21, 2018
1:00 pm - 1:15 pm
Abdullah Alsharhan
View Reservation
Records to show:
SOPs
Photo-14 - SOP - Branson Photoresist Stripper.pdf (593.24 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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