The Branson Barrel Photoresist Stripper is used to remove photoresist residue by means of an oxygen plasma. Much less aggressive than the FabLab March stripper, the Branson minimizes substrate damage.
To save wear and tear, excessive chamber cleaning and tool availability of our ICP etchers, please use the Branson rather than the Oxford tools for all photoresist descum etches.
|Location||FabLab | Photo Tunnel|
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