September 21, 2018 UMD Home FabLab AIMLab
Back to Equipment List Branson Barrel Resist Stripper

The Branson Barrel Photoresist Stripper is used to remove photoresist residue by means of an oxygen plasma. Much less aggressive than the FabLab March stripper, the Branson minimizes substrate damage.

To save wear and tear, excessive chamber cleaning and tool availability of our ICP etchers, please use the Branson rather than the Oxford tools for all photoresist descum etches.

Location FabLab | Photo Tunnel
Manufacturer Branson
Staff Contact MarkMark Lecates
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
Fri, Sep 21, 2018
11:45 am - 12:15 pm
Beihan Zhao
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Deleted by: Beihan Zhao

This is for the plasma conditioning for small amounts of the substrates coated yesterday.
Wed, Sep 19, 2018
3:15 pm - 3:30 pm
Yun Suk Eo
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Wed, Sep 19, 2018
1:30 pm - 2:00 pm
Sahana Rao
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Wed, Sep 19, 2018
10:30 am - 10:45 am
Yun Suk Eo
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Tue, Sep 18, 2018
3:00 pm - 3:15 pm
Yun Suk Eo
View Reservation
Records to show:
Photo-14 - SOP - Branson Photoresist Stripper.pdf (593.24 KB)
index.php (38 B)

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