April 3, 2020 UMD Home FabLab AIMLab
Back to Equipment List Branson Barrel Resist Stripper
Description

The Branson Barrel Photoresist Stripper is used to remove photoresist residue by means of an oxygen plasma. The Branson minimizes substrate damage.

To save wear and tear, excessive chamber cleaning and tool availability of our ICP etchers, please use the Branson rather than the Oxford tools for all photoresist descum etches.

Location FabLab | Photo Tunnel
Manufacturer Branson
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
Logs
Thu, Mar 19, 2020
11:00 am - 11:15 am
Aysanew Abate
View Reservation
Thursday
Tue, Mar 17, 2020
11:45 am - 12:00 pm
Ruben Acevedo
View Reservation
Thu, Mar 12, 2020
12:15 pm - 12:30 pm
Arsalan Atta
View Reservation
Thu, Mar 12, 2020
11:00 am - 11:30 am
Nam Kim
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Tue, Mar 10, 2020
2:00 pm - 2:15 pm
Abhishek Kalpattu
View Reservation
Si Wafer cleaning
Records to show:
SOPs
Photo-14 - SOP - Branson Photoresist Stripper.pdf (593.24 KB)
index.php (38 B)
Manuals

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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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