March 21, 2018 UMD Home FabLab AIMLab
Back to Equipment List Branson Barrel Resist Stripper

The Branson Barrel Photoresist Stripper is used to remove photoresist residue by means of an oxygen plasma. Much less aggressive than the FabLab March stripper, the Branson minimizes substrate damage.

To save wear and tear, excessive chamber cleaning and tool availability of our ICP etchers, please use the Branson rather than the Oxford tools for all photoresist descum etches.

Location FabLab | Photo Tunnel
Manufacturer Branson
Staff Contact MarkMark Lecates
External Non-profit / University
Small Commercial / MTECH
Large Commercial
Reservations No upcoming reservations at this time.
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Tue, Mar 20, 2018
11:45 am - 12:00 pm
Haleigh Eppler
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Fri, Mar 16, 2018
11:30 am - 11:45 am
Andrew Lamont
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Michael Restaino -- cleaning/etching Si
Thu, Mar 15, 2018
12:45 pm - 1:15 pm
Kimberly Lo
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Thu, Mar 15, 2018
10:45 am - 11:00 am
Andrew Lamont
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Bonding PDMS-glass
Tue, Mar 13, 2018
12:00 pm - 12:30 pm
Wu Shang
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For Kim.
Records to show:
Photo-14 - SOP - Branson Photoresist Stripper.pdf (593.24 KB)
index.php (38 B)

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