December 1, 2021 UMD Home FabLab AIMLab
Oxford Etcher (Fluorine) Back to Equipment List
Operational Status ‚óŹ Online
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$75/hr
External Non-profit / University
$116/hr
Small Commercial / MTECH
$158/hr
Large Commercial
$220/hr
No Charge
$0/hr
Reservations
Date Start End User
12/02/2021 10:00 AM 11:00 AM Mark Lecates
Logs
Thu, Dec 02, 2021
10:00 am - 11:00 am
Mark Lecates
View Reservation
Tue, Nov 30, 2021
10:30 am - 11:00 am
Michael Barrow
View Reservation
Mon, Nov 29, 2021
11:45 am - 12:00 pm
Mitchell Gross
View Reservation
Tue, Nov 23, 2021
1:00 pm - 9:00 pm
Mark Lecates
View Reservation
Tue, Nov 23, 2021
10:00 am - 10:30 am
Joseph Brock
View Reservation

Deleted by: Joseph Brock

Records to show:
SOPs
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)
Manuals

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.

Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

Communicate Join Email List
Contact Us
Follow us on TwitterTwitter logo

Links Privacy Policy
Sitemap
RSS

Copyright The University of Maryland University of Maryland
2004-2021