January 16, 2018 UMD Home FabLab AIMLab
Back to Equipment List Oxford Etcher (Fluorine)
Description

This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher.

    Gases plumbed to the system include:
  • SF6
  • C4F8
  • CHF3
  • CF4
  • N2
  • O2

This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.

Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations
Date Start End User
01/16/2018 03:45 PM 04:45 PM Changmin Lee

Please login to make a reservation.
Logs
Tue, Jan 16, 2018
3:45 pm - 4:45 pm
Changmin Lee
View Reservation
SiN etching
Thu, Jan 11, 2018
12:30 pm - 1:00 pm
Aysanew Abate
View Reservation
Wed, Jan 10, 2018
2:30 pm - 3:15 pm
Changmin Lee
View Reservation
Wed, Jan 10, 2018
2:00 pm - 2:30 pm
Young Min Kim
View Reservation
Wed, Jan 10, 2018
1:30 pm - 2:00 pm
Changmin Lee
View Reservation
SiN etching
Records to show:
SOPs
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)
Manuals

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.

Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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