December 13, 2018 UMD Home FabLab AIMLab
Back to Equipment List Oxford Etcher (Fluorine)
Description

This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher.

    Gases plumbed to the system include:
  • SF6
  • C4F8
  • CHF3
  • CF4
  • N2
  • O2

This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.

Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
Logs
Wed, Dec 12, 2018
7:00 pm - 7:30 pm
Yiwen Hu
View Reservation
Wed, Dec 12, 2018
5:30 pm - 6:00 pm
Shengjie Xie
View Reservation

Deleted by: Shengjie Xie

Wed, Dec 12, 2018
5:30 pm - 5:45 pm
Shengjie Xie
View Reservation
Wed, Dec 12, 2018
1:00 pm - 1:30 pm
Fan Yu
View Reservation
NAMR
Wed, Dec 12, 2018
7:00 am - 12:00 pm
Mark Lecates
View Reservation
Records to show:
SOPs
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)
Manuals

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.

Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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