June 24, 2018 UMD Home FabLab AIMLab
Back to Equipment List Oxford Etcher (Fluorine)
Description

This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher.

    Gases plumbed to the system include:
  • SF6
  • C4F8
  • CHF3
  • CF4
  • N2
  • O2

This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.

Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations
Date Start End User
06/28/2018 11:30 AM 12:30 PM Mijin Kim
Logs
Thu, Jun 28, 2018
11:30 am - 12:30 pm
Mijin Kim
View Reservation
Thu, Jun 21, 2018
1:00 pm - 1:15 pm
Mitchell Gross
View Reservation
Tue, Jun 19, 2018
5:00 pm - 5:45 pm
Jiahao Zhan
View Reservation

Deleted by: Jiahao Zhan

Tue, Jun 19, 2018
4:00 pm - 4:45 pm
Jiahao Zhan
View Reservation
Tue, Jun 19, 2018
12:00 pm - 3:45 pm
Sarit Zhukovsky
View Reservation
Records to show:
SOPs
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)
Manuals

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.

Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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