Operational Status | ● Online | |||||||||||||||
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Description | This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher. | |||||||||||||||
Location | FabLab | ETCH Tunnel | |||||||||||||||
Manufacturer |
Oxford Instruments |
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Staff Contact |
Mark Lecates mlecates@umd.edu 301-405-5197 |
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Rates | UMD $81/hr External Non-profit / University $126/hr Small Commercial / MTECH $166/hr Large Commercial $242/hr No Charge $0/hr |
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Reservations |
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Logs |
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SOPs |
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Manuals | You must have lab permissions to view the manuals. Please login to view manuals or contact the lab staff to obtain permissions. |
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Recipes |