September 20, 2018 UMD Home FabLab AIMLab
Back to Equipment List Oxford Etcher (Fluorine)
Description

This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher.

    Gases plumbed to the system include:
  • SF6
  • C4F8
  • CHF3
  • CF4
  • N2
  • O2

This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.

Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations
Date Start End User
09/20/2018 04:00 PM 04:45 PM Changmin Lee
09/24/2018 07:00 AM 03:00 PM Mark Lecates
Logs
Mon, Sep 24, 2018
7:00 am - 3:00 pm
Mark Lecates
View Reservation
Thu, Sep 20, 2018
4:00 pm - 4:45 pm
Changmin Lee
View Reservation
Thu, Sep 20, 2018
1:45 pm - 2:00 pm
Mitchell Gross
View Reservation
Thu, Sep 20, 2018
12:00 pm - 12:45 pm
Subhojit Dutta
View Reservation
Thu, Sep 20, 2018
7:30 am - 9:30 am
Mark Lecates
View Reservation
Records to show:
SOPs
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)
Manuals

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.

Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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