| Operational Status | ● Offline | |||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Description |
This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher.
Gases plumbed to the system include:
SF6-C4F8-CHF3-CF4-Ar-O2-He
This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher. |
|||||||||||||||
| Location | FabLab |
ETCH Tunnel
|
|||||||||||||||
| Manufacturer |
Oxford Instruments |
|||||||||||||||
| Staff Contact |
 Mark Lecatesmlecates@umd.edu 301-405-5197 |
|||||||||||||||
| Rates | Large Commercial $242/hr Small Commercial / MTECH $166/hr External Non-profit / University $126/hr UMD $81/hr No Charge $0/hr |
|||||||||||||||
| Reservations |
|
|||||||||||||||
| Logs |
|
|||||||||||||||
| SOPs |
|
|||||||||||||||
| Manuals | You must have lab permissions to view the manuals. Please login to view manuals or contact the lab staff to obtain permissions. |
|||||||||||||||
| Recipes |
