August 19, 2022 UMD Home FabLab AIMLab
Oxford Etcher (Fluorine) Back to Equipment List
Operational Status ‚óŹ Online
Description This Oxford Plasmalab System 100 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon and silicon oxides. The standard operating procedure and recipes for this tool is loaded into the PC that supports the ICP etcher.
Location FabLab | ETCH Tunnel
Manufacturer Oxford Instruments
Staff Contact MarkMark Lecates
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
Thu, Aug 18, 2022
7:15 pm - 8:00 pm
Fariba Islam
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Thu, Aug 18, 2022
12:30 pm - 1:30 pm
Haotian Wang
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Thu, Aug 18, 2022
9:30 am - 10:15 am
Sam Harper
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Wed, Aug 17, 2022
7:00 pm - 7:30 pm
Ti Xie
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Wed, Aug 17, 2022
3:30 pm - 3:45 pm
Sam Harper
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Records to show:
Oxford Flourine Etcher SOP.pdf (252.38 KB)
index.php (38 B)

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Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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