April 3, 2020 UMD Home FabLab AIMLab
Back to Equipment List MA-4 Suss Mask Aligner
Description The Karl Suss MA-4 Mask Aligner is used with substrates up to 4" (100mm) in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below. This system also offers real-time infrared through-wafer backside alignment.
Location FabLab | Photo Tunnel
Manufacturer Karl Suss MA-4
Staff Contact JohnJohn Abrahams
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Reservations No upcoming reservations at this time.
Fri, Mar 20, 2020
4:30 pm - 5:30 pm
Michael Yeh
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Fri, Mar 20, 2020
1:30 pm - 2:30 pm
John Abrahams
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Critical research project- JHA
Wed, Mar 18, 2020
10:30 am - 11:00 am
Aysanew Abate
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Tue, Mar 17, 2020
10:15 am - 11:30 am
Aysanew Abate
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Deleted by: Aysanew Abate

Mon, Mar 16, 2020
11:30 am - 12:00 pm
Aysanew Abate
View Reservation
Records to show:
MA- 4 Operating Instructions.pdf (21.04 MB)
index.php (38 B)

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