August 19, 2022 UMD Home FabLab AIMLab
MA-4 Suss Mask Aligner Back to Equipment List
Operational Status ‚óŹ Online
Description The Karl Suss MA-4 Mask Aligner is used with substrates up to 4" (100mm) in diameter. It also works for smaller samples. It is a contact/proximity aligner and can be set to utilize either 365 nm or 405 nm light. It is used with a variety of both positive and negative photoresists. Recipes for our standard photoresist processing are attached to the back of the operating instructions below. This system also offers real-time infrared through-wafer backside alignment.
Location FabLab | Photo Tunnel
Manufacturer Karl Suss MA-4
Staff Contact JohnJohn Abrahams
External Non-profit / University
Small Commercial / MTECH
Large Commercial
No Charge
Date Start End User
08/23/2022 11:30 AM 01:00 PM Stephanie Kronstadt
Tue, Aug 23, 2022
11:30 am - 1:00 pm
Stephanie Kronstadt
View Reservation
Thu, Aug 18, 2022
10:30 am - 11:00 am
Ryan Purcell
View Reservation
Wed, Aug 17, 2022
12:00 pm - 12:30 pm
Sean O'Leary
View Reservation
Wed, Aug 17, 2022
11:30 am - 12:00 pm
Mitchell Gross
View Reservation
Tue, Aug 16, 2022
12:30 pm - 1:00 pm
Mitchell Gross
View Reservation
Records to show:
MA- 4 Operating Instructions.pdf (21.04 MB)
index.php (38 B)

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.


Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

Communicate Join Email List
Contact Us
Follow us on TwitterTwitter logo

Links Privacy Policy

Copyright The University of Maryland University of Maryland