December 1, 2021 UMD Home FabLab AIMLab
Operational Status ‚óŹ Online
Description The Trion RIE is used to remove photoresist residue. Plumbed with O2,CF4,CHF3 and Sf6 the Etcher is an aggressive etcher for any organic material. Can be used to etch thin layers of SiO2 ,SiN and Si
Location FabLab | ETCH Tunnel
Manufacturer
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$75/hr
External Non-profit / University
$116/hr
Small Commercial / MTECH
$158/hr
Large Commercial
$220/hr
No Charge
$0/hr
Reservations No upcoming reservations at this time.
Logs
Wed, Dec 01, 2021
11:00 am - 11:30 am
Sheron Lian
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Tue, Nov 30, 2021
5:15 pm - 5:30 pm
Yuqi Zhao
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Tue, Nov 30, 2021
2:15 pm - 5:00 pm
Raymond Mencia
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Mon, Nov 29, 2021
1:30 pm - 2:30 pm
Raymond Mencia
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Tue, Nov 23, 2021
12:30 pm - 7:00 pm
Mark Lecates
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SOPs
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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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