|Description||The Trion RIE is used to remove photoresist residue. Plumbed with O2,CF4 and Sf6 the Etcher is an aggressive etcher for any organic material. Can be used to etch thin layers of SiO2 ,SiN and Si|
|Location||FabLab | ETCH Tunnel|
External Non-profit / University
Small Commercial / MTECH
|Reservations||No upcoming reservations at this time.|
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