June 24, 2018 UMD Home FabLab AIMLab
Description The Trion RIE is used to remove photoresist residue. Plumbed with O2,CF4 and Sf6 the Etcher is an aggressive etcher for any organic material. Can be used to etch thin layers of SiO2 ,SiN and Si
Location FabLab | ETCH Tunnel
Manufacturer
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
Logs
Tue, May 29, 2018
11:15 am - 11:30 am
Evan Yamaguchi
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Wed, Apr 18, 2018
3:00 pm - 3:15 pm
Evan Yamaguchi
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Wednesday
Tue, Apr 17, 2018
4:30 pm - 5:00 pm
Jonathan Vannucci
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Thu, Apr 12, 2018
1:15 pm - 1:30 pm
Jonathan Vannucci
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Wed, Apr 11, 2018
3:45 pm - 4:00 pm
Evan Yamaguchi
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Wednesday
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Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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