July 9, 2020 UMD Home FabLab AIMLab
Description The Trion RIE is used to remove photoresist residue. Plumbed with O2,CF4,CHF3 and Sf6 the Etcher is an aggressive etcher for any organic material. Can be used to etch thin layers of SiO2 ,SiN and Si
Location FabLab | ETCH Tunnel
Manufacturer
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations
Date Start End User
07/10/2020 11:00 AM 11:30 AM Aysanew Abate
Logs
Fri, Jul 10, 2020
11:00 am - 11:30 am
Aysanew Abate
View Reservation
Abrahams-
Thu, Jul 09, 2020
12:00 pm - 5:00 pm
Mark Lecates
View Reservation
Thu, Jul 09, 2020
9:00 am - 10:00 am
Yiwen Hu
View Reservation
Wed, Jul 08, 2020
12:30 pm - 12:45 pm
Aysanew Abate
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Mon, Jul 06, 2020
10:00 am - 10:30 am
Ming-Tso Wei
View Reservation
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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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