December 13, 2018 UMD Home FabLab AIMLab
Description The Trion RIE is used to remove photoresist residue. Plumbed with O2,CF4,CHF3 and Sf6 the Etcher is an aggressive etcher for any organic material. Can be used to etch thin layers of SiO2 ,SiN and Si
Location FabLab | ETCH Tunnel
Manufacturer
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
Logs
Tue, Dec 11, 2018
2:15 pm - 2:30 pm
Evan Yamaguchi
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Tue, Dec 04, 2018
2:30 pm - 4:30 pm
Christopher Greenwell
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RIE etch microcircuit J18232, J18245, J18237 SSCO Restore-L 41.100
Fri, Nov 30, 2018
1:30 pm - 3:30 pm
Nilesh Shah
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Deleted by: Nilesh Shah

For jobs J18232 and J18245 (Charge # 41.100).
Thu, Nov 15, 2018
2:45 pm - 3:00 pm
Evan Yamaguchi
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Wed, Nov 07, 2018
11:00 am - 11:15 am
Evan Yamaguchi
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Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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