May 1, 2025 UMD Home FabLab AIMLab
Operational Status ● Online
Description The Trion RIE is used to remove photoresist residue. Plumbed with O2,CF4,CHF3 and Sf6 the Etcher is an aggressive etcher for any organic material. Can be used to etch thin layers of SiO2 ,SiN and Si
Location FabLab | ETCH Tunnel
Manufacturer
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
Large Commercial
$242/hr
Small Commercial / MTECH
$166/hr
External Non-profit / University
$126/hr
UMD
$81/hr
No Charge
$0/hr
Reservations No upcoming reservations at this time.
Logs
Thu, May 01, 2025
4:45 pm - 5:00 pm
Hongyi Sun
View Reservation
Thu, May 01, 2025
10:00 am - 10:15 am
Gregory Babic
View Reservation
Wed, Apr 30, 2025
10:45 am - 11:00 am
Tahir Mahmud
View Reservation
Tue, Apr 29, 2025
1:15 pm - 2:15 pm
Tahir Mahmud
View Reservation
Mon, Apr 28, 2025
5:00 pm - 5:15 pm
Ziyi Wang
View Reservation
Records to show:
SOPs
Manuals

You must have lab permissions to view the manuals.

Please login to view manuals or contact the lab staff to obtain permissions.

Recipes

Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

Communicate Join Email List
Contact Us
Follow us on TwitterTwitter logo

Links Privacy Policy
Sitemap
RSS

Copyright The University of Maryland University of Maryland
2004-2025