September 20, 2018 UMD Home FabLab AIMLab
Description The Trion RIE is used to remove photoresist residue. Plumbed with O2,CF4 and Sf6 the Etcher is an aggressive etcher for any organic material. Can be used to etch thin layers of SiO2 ,SiN and Si
Location FabLab | ETCH Tunnel
Manufacturer
Staff Contact MarkMark Lecates
mlecates@umd.edu
301-405-5197
Rates
UMD
$71/hr
External Non-profit / University
$108/hr
Small Commercial / MTECH
$150/hr
Large Commercial
$200/hr
Reservations No upcoming reservations at this time.
Logs
Tue, Sep 18, 2018
9:00 am - 11:00 am
Mark Lecates
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Wed, Sep 12, 2018
9:15 am - 9:30 am
Evan Yamaguchi
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Wednesday
Thu, Aug 30, 2018
2:00 pm - 2:15 pm
Evan Yamaguchi
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Thu, Jul 19, 2018
10:30 am - 10:45 am
Evan Yamaguchi
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Mon, Jul 09, 2018
11:30 am - 11:45 am
Evan Yamaguchi
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Colleges A. James Clark School of Engineering
The College of Computer, Mathematical, and Natural Sciences

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