| Operational Status | ● Online | |||||||||||||||
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| Description |
- This Oxford PlasmaPro 100 Cobra 300 is an Inductively Coupled Plasma (ICP) reactive ion etcher. Gases plumbed to the system include: SF6-C4F8-CHF3-CF4-Ar-O2-He This etcher is used primarily for etching silicon per the Bosch process |
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| Location | FabLab |
ETCH Tunnel
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| Manufacturer |
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| Staff Contact |
 Mark Lecatesmlecates@umd.edu 301-405-5197 |
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| Rates | Large Commercial $266/hr Small Commercial / MTECH $183/hr External Non-profit / University $139/hr UMD $89/hr No Charge $0/hr |
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| Reservations | No upcoming reservations at this time. | |||||||||||||||
| Logs |
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| SOPs | ||||||||||||||||
| Manuals | You must have lab permissions to view the manuals. Please login to view manuals or contact the lab staff to obtain permissions. |
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| Recipes |
